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Rupper, Patrick, Amberg, Martin, Hegemann, Dirk, Heuberger, Manfred (2020) Optimization of mica surface hydroxylation in water vapor plasma monitored by optical emission spectroscopy. Applied Surface Science, 509. 145362pp. doi:10.1016/j.apsusc.2020.145362

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Reference TypeJournal (article/letter/editorial)
TitleOptimization of mica surface hydroxylation in water vapor plasma monitored by optical emission spectroscopy
JournalApplied Surface Science
AuthorsRupper, PatrickAuthor
Amberg, MartinAuthor
Hegemann, DirkAuthor
Heuberger, ManfredAuthor
Year2020 (April)Volume509
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2020.145362Search in ResearchGate
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Mindat Ref. ID9940984Long-form Identifiermindat:1:5:9940984:7
GUID0
Full ReferenceRupper, Patrick, Amberg, Martin, Hegemann, Dirk, Heuberger, Manfred (2020) Optimization of mica surface hydroxylation in water vapor plasma monitored by optical emission spectroscopy. Applied Surface Science, 509. 145362pp. doi:10.1016/j.apsusc.2020.145362
Plain TextRupper, Patrick, Amberg, Martin, Hegemann, Dirk, Heuberger, Manfred (2020) Optimization of mica surface hydroxylation in water vapor plasma monitored by optical emission spectroscopy. Applied Surface Science, 509. 145362pp. doi:10.1016/j.apsusc.2020.145362
In(n.d.) Applied Surface Science Vol. 509. Elsevier BV

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