FIGUERAS, A., RODRIGUEZ-CLEMENTE, R., GARELIK, S., SANTISO, J., ARMAS, B ., COMBESCURE, C., MAZEL, A., KIHN, Y., SÉVELY, J. (1991) INFLUENCE OF H2 PARTIAL PRESSURE ON THE MORPHOLOGY AND CRYSTALLIZATION OF SiC LAYERS OBTAINED BY LPCVD USING TETRAMETHYLSILANE. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991228
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | INFLUENCE OF H2 PARTIAL PRESSURE ON THE MORPHOLOGY AND CRYSTALLIZATION OF SiC LAYERS OBTAINED BY LPCVD USING TETRAMETHYLSILANE | ||
Journal | Le Journal de Physique IV | ||
Authors | FIGUERAS, A. | Author | |
RODRIGUEZ-CLEMENTE, R. | Author | ||
GARELIK, S. | Author | ||
SANTISO, J. | Author | ||
ARMAS, B . | Author | ||
COMBESCURE, C. | Author | ||
MAZEL, A. | Author | ||
KIHN, Y. | Author | ||
SÉVELY, J. | Author | ||
Year | 1991 (September) | Volume | 2 |
Publisher | EDP Sciences | ||
DOI | doi:10.1051/jp4:1991228Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 10295518 | Long-form Identifier | mindat:1:5:10295518:9 |
GUID | 0 | ||
Full Reference | FIGUERAS, A., RODRIGUEZ-CLEMENTE, R., GARELIK, S., SANTISO, J., ARMAS, B ., COMBESCURE, C., MAZEL, A., KIHN, Y., SÉVELY, J. (1991) INFLUENCE OF H2 PARTIAL PRESSURE ON THE MORPHOLOGY AND CRYSTALLIZATION OF SiC LAYERS OBTAINED BY LPCVD USING TETRAMETHYLSILANE. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991228 | ||
Plain Text | FIGUERAS, A., RODRIGUEZ-CLEMENTE, R., GARELIK, S., SANTISO, J., ARMAS, B ., COMBESCURE, C., MAZEL, A., KIHN, Y., SÉVELY, J. (1991) INFLUENCE OF H2 PARTIAL PRESSURE ON THE MORPHOLOGY AND CRYSTALLIZATION OF SiC LAYERS OBTAINED BY LPCVD USING TETRAMETHYLSILANE. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991228 | ||
In | (n.d.) Le Journal de Physique IV Vol. 2. EDP Sciences |
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