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SELBMANN, D., LEONHARDT, A., WOLF, E. (1991) CHEMICAL VAPOUR DEPOSITION OF Al-CONTAINING TiC - AND Ti(O,C) - HARD COATINGS. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991270

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Reference TypeJournal (article/letter/editorial)
TitleCHEMICAL VAPOUR DEPOSITION OF Al-CONTAINING TiC - AND Ti(O,C) - HARD COATINGS
JournalLe Journal de Physique IV
AuthorsSELBMANN, D.Author
LEONHARDT, A.Author
WOLF, E.Author
Year1991 (September)Volume2
PublisherEDP Sciences
DOIdoi:10.1051/jp4:1991270Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID10295560Long-form Identifiermindat:1:5:10295560:8
GUID0
Full ReferenceSELBMANN, D., LEONHARDT, A., WOLF, E. (1991) CHEMICAL VAPOUR DEPOSITION OF Al-CONTAINING TiC - AND Ti(O,C) - HARD COATINGS. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991270
Plain TextSELBMANN, D., LEONHARDT, A., WOLF, E. (1991) CHEMICAL VAPOUR DEPOSITION OF Al-CONTAINING TiC - AND Ti(O,C) - HARD COATINGS. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991270
In(n.d.) Le Journal de Physique IV Vol. 2. EDP Sciences

See Also

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BARTSCH, K., LEONHARDT, A., WOLF, E. (1991) COMPOSITION OSCILLATIONS IN HARD MATERIAL LAYERS DEPOSITED FROM THE VAPOUR PHASE. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991267
ASPAR, B., ARMAS, B., COMBESCURE, C., THENEGAL, D. (1991) CHEMICAL VAPOUR DEPOSITION OF THE Al-O-N SYSTEM. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991280
PARAMÊS, M. L.F., CONDE, O. (1993) Structure and morphology of laser assisted chemical vapour deposited TiC coatings. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993329
BACHMANN, P. K., LEERS, D., WIECHERT, D. U. (1991) DIAMOND CHEMICAL VAPOUR DEPOSITION. Le Journal de Physique IV, 2. doi:10.1051/jp4:19912109
ALEXANDROV, S. E., KOVALGIN, A. Y. (1991) REMOTE PLASMA CHEMICAL VAPOUR DEPOSITION OF SILICON NITRIDE FILMS. Le Journal de Physique IV, 2. doi:10.1051/jp4:19912100
FITZER, E. (1991) CHEMICAL VAPOUR DEPOSITON - A REVIEW OF 25 YEARS EXPERIENCE. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991263
FREDRIKSSON, E., CARLSSON, J.-O. (1993) Chemical vapour deposition of Al2O3 on titanium oxides. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993377
AHMED, W., PILKINGTON, R. D., MEAKIN, D. B. (1991) UHV CHEMICAL VAPOUR DEPOSITION OF UNDOPED AND IN-SITU DOPED POLYSILICON FILMS. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991295
Armas, B., de Icaza Herrera, M., Combescure, C., Sibieude, F., Thenegal, D. (1999) Low-pressure chemical vapour deposition of mullite coatings in a cold-wall reactor. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999849
Leonhardt, A., Ritschel, M., Bartsch, K., Graff, A., Täschner, C., Fink, J. (2001) Chemical vapour deposition - a promising method for production of different kinds of carbon nanotubes. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001356
ALEXANDROV, S. E. (1993) Chemical vapour deposition of nitride and oxynitride dielectric films. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993364
 
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