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AHMED, W., PILKINGTON, R. D., MEAKIN, D. B. (1991) UHV CHEMICAL VAPOUR DEPOSITION OF UNDOPED AND IN-SITU DOPED POLYSILICON FILMS. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991295

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Reference TypeJournal (article/letter/editorial)
TitleUHV CHEMICAL VAPOUR DEPOSITION OF UNDOPED AND IN-SITU DOPED POLYSILICON FILMS
JournalLe Journal de Physique IV
AuthorsAHMED, W.Author
PILKINGTON, R. D.Author
MEAKIN, D. B.Author
Year1991 (September)Volume2
PublisherEDP Sciences
DOIdoi:10.1051/jp4:1991295Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID10295585Long-form Identifiermindat:1:5:10295585:1
GUID0
Full ReferenceAHMED, W., PILKINGTON, R. D., MEAKIN, D. B. (1991) UHV CHEMICAL VAPOUR DEPOSITION OF UNDOPED AND IN-SITU DOPED POLYSILICON FILMS. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991295
Plain TextAHMED, W., PILKINGTON, R. D., MEAKIN, D. B. (1991) UHV CHEMICAL VAPOUR DEPOSITION OF UNDOPED AND IN-SITU DOPED POLYSILICON FILMS. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991295
In(n.d.) Le Journal de Physique IV Vol. 2. EDP Sciences

See Also

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BACHMANN, P. K., LEERS, D., WIECHERT, D. U. (1991) DIAMOND CHEMICAL VAPOUR DEPOSITION. Le Journal de Physique IV, 2. doi:10.1051/jp4:19912109
AZZARO, C., SCHEID, E., BIELLE-DASPET, D., DUVERNEUIL, P., BOUDRE, P. (1991) AN UNDERSTANDING OF IN SITU BORON DOPED POLYSILICON FILMS BY CHARACTERIZATION AND SIMULATION. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991209
ASPAR, B., ARMAS, B., COMBESCURE, C., THENEGAL, D. (1991) CHEMICAL VAPOUR DEPOSITION OF THE Al-O-N SYSTEM. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991280
SARRET, M., LIBA, A., BONNAUD, O., LE BIHAN, F., FORTIN, B. (1993) Comparison of physical and electrical properties of ULPCVD and VLPCVD in situ phosphorus doped polysilicon or undoped polysilicon. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993357
ALEXANDROV, S. E., KOVALGIN, A. Y. (1991) REMOTE PLASMA CHEMICAL VAPOUR DEPOSITION OF SILICON NITRIDE FILMS. Le Journal de Physique IV, 2. doi:10.1051/jp4:19912100
AHMED, W., FOORD, J. S., SINGH, N. K., PILKINGTON, R. D. (1991) THE APPLICATION OF A SUPERSONIC MOLECULAR BEAM SCATTERING SYSTEM TO UNDERSTANDING CVD PROCESSES. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991224
PILKINGTON, R. D., JONES, P. A., AHMED, W., TOMLINSON, R. D., HILL, A. E., SMITH, J. J., NUTTALL, R. (1991) LOW PRESSURE MOCVD OF COPPER BASED COMPOUNDS FOR PHOTOVOLTAIC APPLICATIONS. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991232
SELBMANN, D., LEONHARDT, A., WOLF, E. (1991) CHEMICAL VAPOUR DEPOSITION OF Al-CONTAINING TiC - AND Ti(O,C) - HARD COATINGS. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991270
JOHNSON, L. M., SAUNDERS, M., MEAKIN, D. B. (1991) HIGH QUALITY OXIDES FOR LARGE AREA DISPLAYS. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991262
MOTOJIMA, S., MANO, S. (1991) PREPARATION OF SiC FILMS BY PHOTOCHEMICAL VAPOUR DEPOSITION USING A D2 LAMP. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991244
ALEXANDROV, S. E. (1993) Chemical vapour deposition of nitride and oxynitride dielectric films. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993364
 
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