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CARLSSON, J.-O. (1993) Thermal and laser-activated CVD : a comparison. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993327

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Reference TypeJournal (article/letter/editorial)
TitleThermal and laser-activated CVD : a comparison
JournalLe Journal de Physique IV
AuthorsCARLSSON, J.-O.Author
Year1993 (August)Volume3
PublisherEDP Sciences
DOIdoi:10.1051/jp4:1993327Search in ResearchGate
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Mindat Ref. ID10296037Long-form Identifiermindat:1:5:10296037:4
GUID0
Full ReferenceCARLSSON, J.-O. (1993) Thermal and laser-activated CVD : a comparison. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993327
Plain TextCARLSSON, J.-O. (1993) Thermal and laser-activated CVD : a comparison. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993327
In(n.d.) Le Journal de Physique IV Vol. 3. EDP Sciences

See Also

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STUKE, M. (1993) Laser applications in CVD. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993369
WESTBERG, H., BOMAN, M., CARLSSON, J.-O. (1993) Laser-assisted chemical vapour deposition of TiSi2: aspects of deposition and etching. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993330
FREDRIKSSON, E., CARLSSON, J.-O. (1993) Chemical vapour deposition of Al2O3 on titanium oxides. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993377
COUDERC, J.-P. (1993) CVD process engineering : modelling aspects. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993301
LUO, W., REN, P., TAN, Z. (1993) Growth studies of laser-induced CVD diamond films. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993338
MOILANEN, H., LEPPÄVUORI, L., UUSIMÄKI, A. (1993) Direct writing of piezoresistive silicon resistors using laser-induced CVD. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993363
AIT AMER, S., MAGNAUDEIX, S., DUVERNEUIL, P. (1993) On the behavior of rapid thermal CVD reactors. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993304
HITCHMAN, M. L., ZHAO, J. (1993) A consideration of adsorption processes in the CVD of polysilicon. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993314
ALEXANDRESCU, R., CIREASA, R., DRAGNEA, B., MORJAN, I., VOICU, I., ANDREI, A. (1993) Deposition of titanium-based films by laser-assisted thermal CVD of titanium tetrachloride. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993336
BLANQUET, E., GOKOGLU, S. A. (1993) Tractable chemical models for CVD of silicon and carbon. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993305
PELLETIER, J. M., ROBIN, M. (1993) Metal-ceramic joining by laser. Le Journal de Physique IV, 3. doi:10.1051/jp4:19937165
 
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