Reference Type | Journal (article/letter/editorial) |
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Title | Laser-assisted chemical vapour deposition of TiSi2: aspects of deposition and etching |
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Journal | Le Journal de Physique IV |
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Authors | WESTBERG, H. | Author |
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BOMAN, M. | Author |
CARLSSON, J.-O. | Author |
Year | 1993 (August) | Volume | 3 |
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Publisher | EDP Sciences |
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DOI | doi:10.1051/jp4:1993330Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 10296040 | Long-form Identifier | mindat:1:5:10296040:4 |
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GUID | 0 |
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Full Reference | WESTBERG, H., BOMAN, M., CARLSSON, J.-O. (1993) Laser-assisted chemical vapour deposition of TiSi2: aspects of deposition and etching. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993330 |
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Plain Text | WESTBERG, H., BOMAN, M., CARLSSON, J.-O. (1993) Laser-assisted chemical vapour deposition of TiSi2: aspects of deposition and etching. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993330 |
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In | (n.d.) Le Journal de Physique IV Vol. 3. EDP Sciences |
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