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Hitchman, M. L., Zhao, J. (1999) The LPCVD of rutile at low temperatures. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999844

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Reference TypeJournal (article/letter/editorial)
TitleThe LPCVD of rutile at low temperatures
JournalLe Journal de Physique IV
AuthorsHitchman, M. L.Author
Zhao, J.Author
Year1999 (September)Volume9
PublisherEDP Sciences
DOIdoi:10.1051/jp4:1999844Search in ResearchGate
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Mindat Ref. ID10301064Long-form Identifiermindat:1:5:10301064:1
GUID0
Full ReferenceHitchman, M. L., Zhao, J. (1999) The LPCVD of rutile at low temperatures. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999844
Plain TextHitchman, M. L., Zhao, J. (1999) The LPCVD of rutile at low temperatures. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999844
In(n.d.) Le Journal de Physique IV Vol. 9. EDP Sciences

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HITCHMAN, M. L., ZHAO, J. (1993) A consideration of adsorption processes in the CVD of polysilicon. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993314
Davazoglou, D. (1999) Initial stages of growth of LPCVD polysilicon films. Effect of the surface "ageing". Le Journal de Physique IV, 9. doi:10.1051/jp4:19998112
Kleps, I., Angelescu, A. (1999) LPCVD amorphous silicon carbide films, properties and microelectronics applications. Le Journal de Physique IV, 9. doi:10.1051/jp4:19998139
Gupta, V., O'Brien, M., Pronin, A. N. (1999) Measurement of the interface tensile strength at elevated temperatures. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999931
Bock, N. E. (1996) Reset Noise at Low Temperatures. Le Journal de Physique IV, 6. doi:10.1051/jp4:1996331
Beshers, D. N. (1996) Magnetomechanical Damping at Low Temperatures. Le Journal de Physique IV, 6. doi:10.1051/jp4:19968113
Olivares, J., Sangrador, J., Rodríguez, A., Rodríguez, T. (1999) Amorphous SiGe deposition by LPCVD from Si2H6 and GeH4 precursors. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999839
Kosinova, M. L., Fainer, N. I., Rumyantsev, Yu. M., Golubenko, A. N., Kuznetsov, F. A. (1999) LPCVD boron carbonitride films from triethylamine borane. Le Journal de Physique IV, 9. doi:10.1051/jp4:19998115
Schuisky, M., HÃ¥rsta, A. (1999) Epitaxial growth of TiO2 (rutile) thin films by halide CVD. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999847
de Conto, J.-M. (1999) High power accelerators. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999707
Rawiso, M. (1999) Article. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999110
 
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