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Rahtu, A., Hänninen, T., Ritala, M. (2001) In situ characterization of atomic layer deposition of SrTiO3. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013115

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Reference TypeJournal (article/letter/editorial)
TitleIn situ characterization of atomic layer deposition of SrTiO3
JournalLe Journal de Physique IV
AuthorsRahtu, A.Author
Hänninen, T.Author
Ritala, M.Author
Year2001 (August)Volume11
PublisherEDP Sciences
DOIdoi:10.1051/jp4:20013115Search in ResearchGate
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Mindat Ref. ID10302022Long-form Identifiermindat:1:5:10302022:0
GUID0
Full ReferenceRahtu, A., Hänninen, T., Ritala, M. (2001) In situ characterization of atomic layer deposition of SrTiO3. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013115
Plain TextRahtu, A., Hänninen, T., Ritala, M. (2001) In situ characterization of atomic layer deposition of SrTiO3. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013115
In(n.d.) Le Journal de Physique IV Vol. 11. EDP Sciences

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Ritala, M., Juppo, M., Kukli, K., Rahtu, A., Leskelä, M. (1999) In situ characterization of atomic layer deposition processes by a mass spectrometer. Le Journal de Physique IV, 9. doi:10.1051/jp4:19998127
Reijnen, L., Meester, B., Goossens, A., Schoonman, J. (2001) Atomic layer deposition of CuxS. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013138
Pripko, M., Halabica, A., Fröhlich, K., Plecenik, A., Cambel, V., Chromik, S., Machajdik, D. (2001) Growth and characterization of LaMnO3/SrTiO3 bi-layer. Le Journal de Physique IV, 11. doi:10.1051/jp4:20011120
Leskelä, M., Ritala, M. (1995) Atomic Layer Epitaxy in Deposition of Various Oxide and Nitride Thin Films. Le Journal de Physique IV, 5. doi:10.1051/jphyscol:19955111
Matero, R., Ritala, M., Leskelä, M., Salo, T., Aromaa, J., Forsén, O. (1999) Atomic layer deposited thin films for corrosion protection. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999862
Niilisk, A., Rosental, A., Uustare, T., Kasikov, A., Tarre, A. (2001) Chloride atomic-layer chemical vapor deposition of TiO2 with a chloride pretreatment of substrates. Le Journal de Physique IV, 11. doi:10.1051/jp4:20011116
Meester, B., Reijnen, L., Goossens, A., Schoonman, J. (2001) Comparative study of atomic layer deposition and low-pressure MOCVD of copper sulfide thin films. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013144
Fuchs, D., Adam, M., Schneider, R. (2001) Dielectric properties of Ti-deficient SrTiO3-δ thin films. Le Journal de Physique IV, 11. doi:10.1051/jp4:20011111
Masi, M. (2001) Multiscale approach to material synthesis by gas phase deposition. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001315
Langeron, T., Filleul, M. P., Van Humbeeck, J. (2001) Characterization of closed nickel-titanium orthodontic coil springs. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001894
Nagy, J. B., Fonseca, A. (2001) Synthesis and characterization of carbon nanotubes. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001352
 
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