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Lavenac, J., Langlais, F., Bourrat, X., Naslain, R. (2001) Deposition process of laminar pyrocarbon from propane. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013127

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Reference TypeJournal (article/letter/editorial)
TitleDeposition process of laminar pyrocarbon from propane
JournalLe Journal de Physique IV
AuthorsLavenac, J.Author
Langlais, F.Author
Bourrat, X.Author
Naslain, R.Author
Year2001 (August)Volume11
PublisherEDP Sciences
DOIdoi:10.1051/jp4:20013127Search in ResearchGate
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Mindat Ref. ID10302035Long-form Identifiermindat:1:5:10302035:0
GUID0
Full ReferenceLavenac, J., Langlais, F., Bourrat, X., Naslain, R. (2001) Deposition process of laminar pyrocarbon from propane. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013127
Plain TextLavenac, J., Langlais, F., Bourrat, X., Naslain, R. (2001) Deposition process of laminar pyrocarbon from propane. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013127
In(n.d.) Le Journal de Physique IV Vol. 11. EDP Sciences

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Descamps, B., Vignoles, G. L., FĆ©ron, O., Lavenac, J., Langlais, F. (2001) Kinetic modelling of gas-phase decomposition of propane : Correlation with pyrocarbon deposition. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001313
Bourrat, Xavier, Lavenac, Jerome, Langlais, Francis, Naslain, Roger (2001) The role of pentagons in the growth of laminar pyrocarbon. Carbon, 39. 2376-2380 doi:10.1016/s0008-6223(01)00223-8
LOUMAGNE, F., LANGLAIS, F., NASLAIN, R. (1993) Kinetic laws of the chemical process in the CVD of SiC ceramics from CH3SiCl3-H2 precursor. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993373
Descamps, CeĢdric, Vignoles, GeĢrard L., FeĢron, Olivier, Langlais, Francis, Lavenac, JeĢroĢ‚me (2001) Correlation Between Homogeneous Propane Pyrolysis and Pyrocarbon Deposition. Journal of the Electrochemical Society, 148. doi:10.1149/1.1402981
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Langlais, F., Loumagne, F., Lespiaux, D., Schamm, S., Naslain, R. (1995) Kinetic Processes in the CVD of SiC from CH3SiCl3-H2 in a Vertical Hot-Wall Reactor. Le Journal de Physique IV, 5. doi:10.1051/jphyscol:1995510
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Deschanvres, J. L., Meffre, W. (2001) Deposition by an aerosol assisted MOCVD process of Eu or Er doped Y2O3-P2O5 thin films. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001383
 
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