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Buragohain, Pratyush, Erickson, Adam, Kariuki, Pamenas, Mittmann, Terence, Richter, Claudia, Lomenzo, Patrick D., Lu, Haidong, Schenk, Tony, Mikolajick, Thomas, Schroeder, Uwe, Gruverman, Alexei (2019) Fluid Imprint and Inertial Switching in Ferroelectric La:HfO2 Capacitors. ACS Applied Materials & Interfaces, 11. 35115-35121 doi:10.1021/acsami.9b11146

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Reference TypeJournal (article/letter/editorial)
TitleFluid Imprint and Inertial Switching in Ferroelectric La:HfO2 Capacitors
JournalACS Applied Materials & Interfaces
AuthorsBuragohain, PratyushAuthor
Erickson, AdamAuthor
Kariuki, PamenasAuthor
Mittmann, TerenceAuthor
Richter, ClaudiaAuthor
Lomenzo, Patrick D.Author
Lu, HaidongAuthor
Schenk, TonyAuthor
Mikolajick, ThomasAuthor
Schroeder, UweAuthor
Gruverman, AlexeiAuthor
Year2019 (September 25)Volume11
PublisherAmerican Chemical Society (ACS)
DOIdoi:10.1021/acsami.9b11146Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID10852811Long-form Identifiermindat:1:5:10852811:0
GUID0
Full ReferenceBuragohain, Pratyush, Erickson, Adam, Kariuki, Pamenas, Mittmann, Terence, Richter, Claudia, Lomenzo, Patrick D., Lu, Haidong, Schenk, Tony, Mikolajick, Thomas, Schroeder, Uwe, Gruverman, Alexei (2019) Fluid Imprint and Inertial Switching in Ferroelectric La:HfO2 Capacitors. ACS Applied Materials & Interfaces, 11. 35115-35121 doi:10.1021/acsami.9b11146
Plain TextBuragohain, Pratyush, Erickson, Adam, Kariuki, Pamenas, Mittmann, Terence, Richter, Claudia, Lomenzo, Patrick D., Lu, Haidong, Schenk, Tony, Mikolajick, Thomas, Schroeder, Uwe, Gruverman, Alexei (2019) Fluid Imprint and Inertial Switching in Ferroelectric La:HfO2 Capacitors. ACS Applied Materials & Interfaces, 11. 35115-35121 doi:10.1021/acsami.9b11146
In(2019) ACS Applied Materials & Interfaces Vol. 11. American Chemical Society (ACS)

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Stolichnov, Igor, Cavalieri, Matteo, Colla, Enrico, Schenk, Tony, Mittmann, Terence, Mikolajick, Thomas, Schroeder, Uwe, Ionescu, Adrian M. (2018) Genuinely Ferroelectric Sub-1-Volt-Switchable Nanodomains in HfxZr(1–x)O2 Ultrathin Capacitors. ACS Applied Materials & Interfaces, 10. 30514-30521 doi:10.1021/acsami.8b07988
Buragohain, P., Richter, C., Schenk, T., Lu, H., Mikolajick, T., Schroeder, U., Gruverman, A. (2018) Nanoscopic studies of domain structure dynamics in ferroelectric La:HfO2 capacitors. Applied Physics Letters, 112 (22). 222901pp. doi:10.1063/1.5030562
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