Kim, Seokhoon, Woo, Sanghyun, Kim, Hyungchul, Kim, Inhoe, Lee, Keunwoo, Jeong, Wooho, Park, Taeyong, Jeon, Hyeongtag (2008) Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation. Journal of the Korean Physical Society, 52 (4). 1103-1108 doi:10.3938/jkps.52.1103
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation | ||
| Journal | Journal of the Korean Physical Society | ||
| Authors | Kim, Seokhoon | Author | |
| Woo, Sanghyun | Author | ||
| Kim, Hyungchul | Author | ||
| Kim, Inhoe | Author | ||
| Lee, Keunwoo | Author | ||
| Jeong, Wooho | Author | ||
| Park, Taeyong | Author | ||
| Jeon, Hyeongtag | Author | ||
| Year | 2008 (April 15) | Volume | 52 |
| Issue | 4 | ||
| Publisher | Korean Physical Society | ||
| DOI | doi:10.3938/jkps.52.1103Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 11232851 | Long-form Identifier | mindat:1:5:11232851:5 |
| GUID | 0 | ||
| Full Reference | Kim, Seokhoon, Woo, Sanghyun, Kim, Hyungchul, Kim, Inhoe, Lee, Keunwoo, Jeong, Wooho, Park, Taeyong, Jeon, Hyeongtag (2008) Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation. Journal of the Korean Physical Society, 52 (4). 1103-1108 doi:10.3938/jkps.52.1103 | ||
| Plain Text | Kim, Seokhoon, Woo, Sanghyun, Kim, Hyungchul, Kim, Inhoe, Lee, Keunwoo, Jeong, Wooho, Park, Taeyong, Jeon, Hyeongtag (2008) Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation. Journal of the Korean Physical Society, 52 (4). 1103-1108 doi:10.3938/jkps.52.1103 | ||
| In | (2008, April) Journal of the Korean Physical Society Vol. 52 (4) Korean Physical Society | ||
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