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Keller, Adrian, Facsko, Stefan (2010) Tuning the quality of nanoscale ripple patterns by sequential ion-beam sputtering. Physical Review B, 82 (15) doi:10.1103/physrevb.82.155444

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Reference TypeJournal (article/letter/editorial)
TitleTuning the quality of nanoscale ripple patterns by sequential ion-beam sputtering
JournalPhysical Review B
AuthorsKeller, AdrianAuthor
Facsko, StefanAuthor
Year2010 (October 26)Volume82
Issue15
PublisherAmerican Physical Society (APS)
DOIdoi:10.1103/physrevb.82.155444Search in ResearchGate
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Mindat Ref. ID14210116Long-form Identifiermindat:1:5:14210116:4
GUID0
Full ReferenceKeller, Adrian, Facsko, Stefan (2010) Tuning the quality of nanoscale ripple patterns by sequential ion-beam sputtering. Physical Review B, 82 (15) doi:10.1103/physrevb.82.155444
Plain TextKeller, Adrian, Facsko, Stefan (2010) Tuning the quality of nanoscale ripple patterns by sequential ion-beam sputtering. Physical Review B, 82 (15) doi:10.1103/physrevb.82.155444
In(2010, October) Physical Review B Vol. 82 (15) American Physical Society (APS)

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Keller, Adrian, Cuerno, Rodolfo, Facsko, Stefan, Möller, Wolfhard (2009) Anisotropic scaling of ripple morphologies on high-fluence sputtered silicon. Physical Review B, 79 (11) doi:10.1103/physrevb.79.115437
Keller, Adrian, Facsko, Stefan, Möller, Wolfhard (2009) Evolution of ion-induced ripple patterns on SiO2 surfaces. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 267 (4). 656-659 doi:10.1016/j.nimb.2008.11.044
Keller, Adrian, Facsko, Stefan, Möller, Wolfhard (2008) Minimization of topological defects in ion-induced ripple patterns on silicon. New Journal of Physics, 10. 63004pp. doi:10.1088/1367-2630/10/6/063004
Ou, Xin, Keller, Adrian, Helm, Manfred, Fassbender, Jürgen, Facsko, Stefan (2013) Reverse Epitaxy of Ge: Ordered and Faceted Surface Patterns. Physical Review Letters, 111 (1). doi:10.1103/physrevlett.111.016101
Bobek, T., Facsko, S., Kurz, H., Dekorsy, T., Xu, M., Teichert, C. (2003) Temporal evolution of dot patterns during ion sputtering. Physical Review B, 68 (8) doi:10.1103/physrevb.68.085324
Facsko, S., Kurz, H., Dekorsy, T. (2001) Energy dependence of quantum dot formation by ion sputtering. Physical Review B, 63 (16) doi:10.1103/physrevb.63.165329
Keller, Adrian, Nicoli, Matteo, Facsko, Stefan, Cuerno, Rodolfo (2011) Dynamic effects induced by renormalization in anisotropic pattern forming systems. Physical Review E, 84 (1) doi:10.1103/physreve.84.015202
Keller, Adrian, Facsko, Stefan, Möller, Wolfhard (2009) The morphology of amorphous SiO2surfaces during low energy ion sputtering. Journal of Physics: Condensed Matter, 21 (49). 495305pp. doi:10.1088/0953-8984/21/49/495305
Keller, Adrian, Fritzsche, Monika, Ogaki, Ryosuke, Bald, Ilko, Facsko, Stefan, Dong, Mingdong, Kingshott, Peter, Besenbacher, Flemming (2011) Tuning the hydrophobicity of mica surfaces by hyperthermal Ar ion irradiation. The Journal of Chemical Physics, 134 (10). 104705pp. doi:10.1063/1.3561292
Keller, Adrian, Peverini, Luca, Grenzer, Jörg, Kovacs, György J., Mücklich, Arndt, Facsko, Stefan (2011) Polycrystalline Ni thin films on nanopatterned Si substrates: From highly conformal to nonconformal anisotropic growth. Physical Review B, 84 (3) doi:10.1103/physrevb.84.035423
Teshome, Bezuayehu, Facsko, Stefan, Keller, Adrian (2014) Topography-controlled alignment of DNA origami nanotubes on nanopatterned surfaces. Nanoscale, 6. 1790-1796 doi:10.1039/c3nr04627c
 
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