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Keller, Adrian, Cuerno, Rodolfo, Facsko, Stefan, Möller, Wolfhard (2009) Anisotropic scaling of ripple morphologies on high-fluence sputtered silicon. Physical Review B, 79 (11) doi:10.1103/physrevb.79.115437

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Reference TypeJournal (article/letter/editorial)
TitleAnisotropic scaling of ripple morphologies on high-fluence sputtered silicon
JournalPhysical Review B
AuthorsKeller, AdrianAuthor
Cuerno, RodolfoAuthor
Facsko, StefanAuthor
Möller, WolfhardAuthor
Year2009 (March 26)Volume79
Issue11
PublisherAmerican Physical Society (APS)
DOIdoi:10.1103/physrevb.79.115437Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID14200435Long-form Identifiermindat:1:5:14200435:9
GUID0
Full ReferenceKeller, Adrian, Cuerno, Rodolfo, Facsko, Stefan, Möller, Wolfhard (2009) Anisotropic scaling of ripple morphologies on high-fluence sputtered silicon. Physical Review B, 79 (11) doi:10.1103/physrevb.79.115437
Plain TextKeller, Adrian, Cuerno, Rodolfo, Facsko, Stefan, Möller, Wolfhard (2009) Anisotropic scaling of ripple morphologies on high-fluence sputtered silicon. Physical Review B, 79 (11) doi:10.1103/physrevb.79.115437
In(2009, March) Physical Review B Vol. 79 (11) American Physical Society (APS)

See Also

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Keller, Adrian, Nicoli, Matteo, Facsko, Stefan, Cuerno, Rodolfo (2011) Dynamic effects induced by renormalization in anisotropic pattern forming systems. Physical Review E, 84 (1) doi:10.1103/physreve.84.015202
Keller, Adrian, Facsko, Stefan, Möller, Wolfhard (2008) Minimization of topological defects in ion-induced ripple patterns on silicon. New Journal of Physics, 10. 63004pp. doi:10.1088/1367-2630/10/6/063004
Keller, Adrian, Nicoli, Matteo, Facsko, Stefan, Cuerno, Rodolfo (2012) Erratum: Dynamic effects induced by renormalization in anisotropic pattern forming systems [Phys. Rev. E84, 015202(R) (2011)]. Physical Review E, 85 (2) doi:10.1103/physreve.85.029905
Keller, Adrian, Facsko, Stefan, Möller, Wolfhard (2009) Evolution of ion-induced ripple patterns on SiO2 surfaces. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 267 (4). 656-659 doi:10.1016/j.nimb.2008.11.044
Keller, Adrian, Facsko, Stefan (2010) Tuning the quality of nanoscale ripple patterns by sequential ion-beam sputtering. Physical Review B, 82 (15) doi:10.1103/physrevb.82.155444
Keller, Adrian, Facsko, Stefan, Möller, Wolfhard (2009) The morphology of amorphous SiO2surfaces during low energy ion sputtering. Journal of Physics: Condensed Matter, 21 (49). 495305pp. doi:10.1088/0953-8984/21/49/495305
Keller, Adrian, Peverini, Luca, Grenzer, Jörg, Kovacs, György J., Mücklich, Arndt, Facsko, Stefan (2011) Polycrystalline Ni thin films on nanopatterned Si substrates: From highly conformal to nonconformal anisotropic growth. Physical Review B, 84 (3) doi:10.1103/physrevb.84.035423
Cuerno, Rodolfo, Barabási, Albert-László (1995) Dynamic Scaling of Ion-Sputtered Surfaces. Physical Review Letters, 74 (23). 4746-4749 doi:10.1103/physrevlett.74.4746
Brown, Ari-David, Erlebacher, Jonah (2005) Temperature and fluence effects on the evolution of regular surface morphologies on ion-sputtered Si(111) Physical Review B, 72 (7) doi:10.1103/physrevb.72.075350
Muñoz-García, Javier, Castro, Mario, Cuerno, Rodolfo (2006) Nonlinear Ripple Dynamics on Amorphous Surfaces Patterned by Ion Beam Sputtering. Physical Review Letters, 96 (8). doi:10.1103/physrevlett.96.086101
Ou, Xin, Keller, Adrian, Helm, Manfred, Fassbender, Jürgen, Facsko, Stefan (2013) Reverse Epitaxy of Ge: Ordered and Faceted Surface Patterns. Physical Review Letters, 111 (1). doi:10.1103/physrevlett.111.016101
 
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