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Ma, Jie, Yu, Zhi Gen, Zhang, Yong-Wei (2017) Tuning deep dopants to shallow ones in 2D semiconductors by substrate screening: The case of XS (X = Cl, Br, I) in MoS2. Physical Review B, 95 (16) doi:10.1103/physrevb.95.165447

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Reference TypeJournal (article/letter/editorial)
TitleTuning deep dopants to shallow ones in 2D semiconductors by substrate screening: The case of XS (X = Cl, Br, I) in MoS2
JournalPhysical Review B
AuthorsMa, JieAuthor
Yu, Zhi GenAuthor
Zhang, Yong-WeiAuthor
Year2017 (April 28)Volume95
Issue16
PublisherAmerican Physical Society (APS)
DOIdoi:10.1103/physrevb.95.165447Search in ResearchGate
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Mindat Ref. ID14245841Long-form Identifiermindat:1:5:14245841:1
GUID0
Full ReferenceMa, Jie, Yu, Zhi Gen, Zhang, Yong-Wei (2017) Tuning deep dopants to shallow ones in 2D semiconductors by substrate screening: The case of XS (X = Cl, Br, I) in MoS2. Physical Review B, 95 (16) doi:10.1103/physrevb.95.165447
Plain TextMa, Jie, Yu, Zhi Gen, Zhang, Yong-Wei (2017) Tuning deep dopants to shallow ones in 2D semiconductors by substrate screening: The case of XS (X = Cl, Br, I) in MoS2. Physical Review B, 95 (16) doi:10.1103/physrevb.95.165447
In(2017, April) Physical Review B Vol. 95 (16) American Physical Society (APS)


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