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KAMINS, T. I. (1974) ChemInform Abstract: DIFFUSION IN THIN SILICON FILMS FORMED BY ELECTROCHEMICAL ETCHING. Chemischer Informationsdienst, 5 (21) doi:10.1002/chin.197421009

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Reference TypeJournal (article/letter/editorial)
TitleChemInform Abstract: DIFFUSION IN THIN SILICON FILMS FORMED BY ELECTROCHEMICAL ETCHING
JournalChemischer Informationsdienst
AuthorsKAMINS, T. I.Author
Year1974 (May 28)Volume5
Issue21
PublisherWiley
DOIdoi:10.1002/chin.197421009Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID14686073Long-form Identifiermindat:1:5:14686073:9
GUID0
Full ReferenceKAMINS, T. I. (1974) ChemInform Abstract: DIFFUSION IN THIN SILICON FILMS FORMED BY ELECTROCHEMICAL ETCHING. Chemischer Informationsdienst, 5 (21) doi:10.1002/chin.197421009
Plain TextKAMINS, T. I. (1974) ChemInform Abstract: DIFFUSION IN THIN SILICON FILMS FORMED BY ELECTROCHEMICAL ETCHING. Chemischer Informationsdienst, 5 (21) doi:10.1002/chin.197421009
In(1974, May) Chemischer Informationsdienst Vol. 5 (21) Wiley

See Also

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Kamins, T. I. (1974) Diffusion in Thin Silicon Films Formed by Electrochemical Etching. Journal of the Electrochemical Society, 121. 286pp. doi:10.1149/1.2401797
KAMINS, T. I., DEAL, B. E. (1975) ChemInform Abstract: CHARACTERISTICS OF SI-SIO2 INTERFACES BENEATH THIN SILICON FILMS DEFINED BY ELECTROCHEMICAL ETCHING. Chemischer Informationsdienst, 6 (27) doi:10.1002/chin.197527021
KAMINS, T. I. (1974) ChemInform Abstract: DEFORMATION OCCURRING DURING THE DEPOSITION OF POLYCRYSTALLINE SILICON FILMS. Chemischer Informationsdienst, 5 (32) doi:10.1002/chin.197432047
KAMINS, T. I. (1980) ChemInform Abstract: STRUCTURE AND PROPERTIES OF LPCVD SILICON FILMS. Chemischer Informationsdienst, 11 (28) doi:10.1002/chin.198028020
GIANI, ENRICO, KELLY, ROGER (1974) ChemInform Abstract: A STUDY OF SNO2 THIN FILMS FORMED BY SPUTTERING AND BY ANODIZING. Chemischer Informationsdienst, 5 (39) doi:10.1002/chin.197439010
INMAN, D., WEAVER, M. J. (1974) ChemInform Abstract: ELECTROCHEMICAL STUDIES OF THIN OXIDE FILMS FORMED ON PLATINUM IN MOLTEN LICL-KCL CONTAINING OXIDE IONS. Chemischer Informationsdienst, 5 (20) doi:10.1002/chin.197420031
ANDERSON, R. M. (1974) ChemInform Abstract: MICROSTRUCTURAL ANALYSIS OF EVAPORATED AND PYROLYTIC SILICON THIN FILMS. Chemischer Informationsdienst, 5 (5) doi:10.1002/chin.197405004
MANDURAH, M. M., SARASWAT, K. C., KAMINS, T. I. (1979) ChemInform Abstract: PHOSPHORUS DOPING OF LOW PRESSURE CHEMICALLY VAPOR-DEPOSITED SILICON FILMS. Chemischer Informationsdienst, 10 (42) doi:10.1002/chin.197942005
Kamins, T. I. (1975) Characteristics of Si-SiO[sub 2] Interfaces Beneath Thin Silicon Films Defined by Electrochemical Etching. Journal of the Electrochemical Society, 122. 557pp. doi:10.1149/1.2134259
KAMINS, T. I., MANDURAH, M. M., SARASWAT, K. C. (1978) ChemInform Abstract: STRUCTURE AND STABILITY OF LOW PRESSURE CHEMICALLY VAPOR-DEPOSITED SILICON FILMS. Chemischer Informationsdienst, 9 (38) doi:10.1002/chin.197838014
ALESSANDRINI, E. I., CAMPBELL, D. R. (1974) ChemInform Abstract: CATALYZED CRYSTALLISATION IN SIO2 THIN FILMS. Chemischer Informationsdienst, 5 (47) doi:10.1002/chin.197447011
 
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