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Kosaka, Shin, Kojima, Kazuyoshi, Shinoki, Fujitoshi, Shoji, Akira, Hayakawa, Hisao (1982) NbN, Nb Double-Layered Base-Electrode Josephson Junctions. Japanese Journal of Applied Physics, 21. 319 doi:10.7567/jjaps.21s1.319

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Reference TypeJournal (article/letter/editorial)
TitleNbN, Nb Double-Layered Base-Electrode Josephson Junctions
JournalJapanese Journal of Applied Physics
AuthorsKosaka, ShinAuthor
Kojima, KazuyoshiAuthor
Shinoki, FujitoshiAuthor
Shoji, AkiraAuthor
Hayakawa, HisaoAuthor
Year1982 (January 1)Volume21
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjaps.21s1.319Search in ResearchGate
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Mindat Ref. ID14985979Long-form Identifiermindat:1:5:14985979:2
GUID0
Full ReferenceKosaka, Shin, Kojima, Kazuyoshi, Shinoki, Fujitoshi, Shoji, Akira, Hayakawa, Hisao (1982) NbN, Nb Double-Layered Base-Electrode Josephson Junctions. Japanese Journal of Applied Physics, 21. 319 doi:10.7567/jjaps.21s1.319
Plain TextKosaka, Shin, Kojima, Kazuyoshi, Shinoki, Fujitoshi, Shoji, Akira, Hayakawa, Hisao (1982) NbN, Nb Double-Layered Base-Electrode Josephson Junctions. Japanese Journal of Applied Physics, 21. 319 doi:10.7567/jjaps.21s1.319
In(1982) Japanese Journal of Applied Physics Vol. 21. Japan Society of Applied Physics

See Also

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Shoji, Akira, Shinoki, Fujitoshi, Kosaka, Shin, Hayakawa, Hisao (1982) Josephson Tunnel Junctions with Nb, NbN Double-Layered Electrodes. Japanese Journal of Applied Physics, 21. doi:10.1143/jjap.21.l192
Shinoki, Fujitoshi, Takada, Susumu, Kosaka, Shin, Hayakawa, Hisao (1980) Fabrication of High Quality NbN/Pb Josephson Junction. Japanese Journal of Applied Physics, 19. 591 doi:10.7567/jjaps.19s1.591
Shoji, Akira, Shinoki, Fujitoshi, Kosaka, Shin, Hayakawa, Hisao (1981) Tunneling Characteristics of NbN/NbN Josephson Junctions with Glow-Discharge-Produced Amorphous Silicon Barriers. Japanese Journal of Applied Physics, 20 (8) doi:10.1143/jjap.20.l587
Shoji, Akira, Aoyagi, Masahiro, Kosaka, Shin, Shinoki, Fujitoshi (1987) Niobium Nitride Josephson Junctions with Double-Tunnel Barriers. Japanese Journal of Applied Physics, 26. 1611 doi:10.7567/jjaps.26s3.1611
Shoji, Akira, Shinoki, Fujitoshi, Kosaka, Shin, Aoyagi, Masahiro, Hayakawa, Hisao (1982) New fabrication process for Josephson tunnel junctions with (niobium nitride, niobium) double‐layered electrodes. Applied Physics Letters, 41 (11). 1097-1099 doi:10.1063/1.93378
Shoji, Akira, Aoyagi, Masahiro, Kosaka, Shin, Shinoki, Fujitoshi, Hayakawa, Hisao (1985) Niobium nitride Josephson tunnel junctions with magnesium oxide barriers. Applied Physics Letters, 46 (11). 1098-1100 doi:10.1063/1.95774
Kosaka, Shin, Shoji, Akira, Aoyagi, Masahiro, Shinoki, Fujitoshi, Nakagawa, Hiroshi, Takada, Susumu, Hayakawa, Hisao (1983) High speed logic operations of all refractory Josephson integrated circuits. Applied Physics Letters, 43 (2). 213-215 doi:10.1063/1.94259
Morohashi, Shin’ichi, Shinoki, Fujitoshi, Shoji, Akira, Aoyagi, Masahiro, Hayakawa, Hisao (1985) High quality Nb/Al‐AlOx/Nb Josephson junction. Applied Physics Letters, 46 (12). 1179-1181 doi:10.1063/1.95696
Aoyagi, Masahiro, Shoji, Akira, Kosaka, Shin, Shinoki, Fujitoshi, Nakagawa, Hiroshi, Takada, Susumu, Hayakawa, Hisao (1984) All Niobium Nitride Josephson Junction with Hydrogenated Amorphous Silicon Barrier and its Application to the Logic Circuit. Japanese Journal of Applied Physics, 23. doi:10.1143/jjap.23.l916
Takada, Susumu, Kosaka, Shin, Hayakawa, Hisao (1980) Current Injection Logic Gate with Four Josephson Junctions. Japanese Journal of Applied Physics, 19. 607 doi:10.7567/jjaps.19s1.607
Nakanishi, Masakazu, Koyanagi, Masao, Kosaka, Shin, Shoji, Akira, Aoyagi, Masahiro, Shinoki, Fujitoshi (1987) Integrated DC–SQUID Magnetometer. Japanese Journal of Applied Physics, 26. 1050-1055 doi:10.1143/jjap.26.1050
 
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