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Gamo, Kenji, Inomoto, Yasumasa, Ochiai, Yukinori, Namba, Susumu (1982) B, Sb and Si Liquid Metal Alloy Ion Sources for Submicron Fabrication. Japanese Journal of Applied Physics, 21. 415 doi:10.7567/jjaps.21s1.415

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Reference TypeJournal (article/letter/editorial)
TitleB, Sb and Si Liquid Metal Alloy Ion Sources for Submicron Fabrication
JournalJapanese Journal of Applied Physics
AuthorsGamo, KenjiAuthor
Inomoto, YasumasaAuthor
Ochiai, YukinoriAuthor
Namba, SusumuAuthor
Year1982 (January 1)Volume21
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjaps.21s1.415Search in ResearchGate
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Mindat Ref. ID14985995Long-form Identifiermindat:1:5:14985995:2
GUID0
Full ReferenceGamo, Kenji, Inomoto, Yasumasa, Ochiai, Yukinori, Namba, Susumu (1982) B, Sb and Si Liquid Metal Alloy Ion Sources for Submicron Fabrication. Japanese Journal of Applied Physics, 21. 415 doi:10.7567/jjaps.21s1.415
Plain TextGamo, Kenji, Inomoto, Yasumasa, Ochiai, Yukinori, Namba, Susumu (1982) B, Sb and Si Liquid Metal Alloy Ion Sources for Submicron Fabrication. Japanese Journal of Applied Physics, 21. 415 doi:10.7567/jjaps.21s1.415
In(1982) Japanese Journal of Applied Physics Vol. 21. Japan Society of Applied Physics

See Also

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Gamo, Kenji, Ukegawa, Takeshi, Inomoto, Yasumasa, Ka, Ki Kan, Namba, Susumu (1980) B, As and Si Field Ion Sources. Japanese Journal of Applied Physics, 19 (10) doi:10.1143/jjap.19.l595
Gamo, Kenji, Ochiai, Yukinori, Namba, Susumu (1982) Ion Beam Assisted Maskless Etching of GaAs by 50 keV Focused Ion Beam. Japanese Journal of Applied Physics, 21. doi:10.1143/jjap.21.l792
Gamo, Kenji, Matsui, Takao, Namba, Susumu (1983) Characteristics of Be-Si-Au Ternary Alloy Liquid Metal Ion Sources. Japanese Journal of Applied Physics, 22. doi:10.1143/jjap.22.l692
Gamo, Kenji, Matsui, Takao, Namba, Susumu (1984) Characteristics of Be-Si-Au Ternary Alloy Liquid Metal Ion Sources. Japanese Journal of Applied Physics, 23 (1) doi:10.1143/jjap.23.l59
Gamo, Kenji, Kajiya, Atsuhiro, Namba, Susumu (1979) Fabrication of Niobium Weak Links by Means of Electron Beam Lithography and Ion Implantation. Japanese Journal of Applied Physics, 18. 201 doi:10.7567/jjaps.18s1.201
Gamo, Kenji, Moriizumi, Koichi, Ochiai, Yukinori, Takai, Mikio, Namba, Susumu, Shiokawa, Takao, Minamisono, Tadanori (1984) Maskless Submicrometer Pattern Formation of Cr Films by Focused Sb Ion Implantation. Japanese Journal of Applied Physics, 23. doi:10.1143/jjap.23.l642
Ochiai, Yukinori, Shihoyama, Kazuhiko, Masuyama, Akio, Gamo, Kenji, Shiokawa, Takao, Toyoda, Koichi, Namba, Susumu (1985) Maskless Ion Beam Assisted Etching of Si Using Chlorine Gas. Japanese Journal of Applied Physics, 24. doi:10.1143/jjap.24.l169
Gamo, Kenji, Arimoto, Kazutami, Namba, Susumu (1981) New Type of Nb Microbridges. Japanese Journal of Applied Physics, 20. 331 doi:10.7567/jjaps.20s1.331
Ochiai, Yukinori, Gamo, Kenji, Namba, Susumu (1984) Characteristics of Ion Beam Assisted Etching of GaAs Using Focused Ion Beam: Dependence on Gas Pressure. Japanese Journal of Applied Physics, 23. doi:10.1143/jjap.23.l400
Ochiai, Yukinori, Shihoyama, Kazuhiko, Shiokawa, Takao, Toyoda, Koichi, Masuyama, Akio, Gamo, Kenji, Namba, Susumu (1986) Maskless Etching of AN Using Focused Ion Beam. Japanese Journal of Applied Physics, 25. doi:10.1143/jjap.25.l526
Moriwaki, Kazuyuki, Aritome, Hiroaki, Namba, Susumu (1981) High Resolution Fabrication of Submicron Structures by Ion Beam Lithography. Japanese Journal of Applied Physics, 20. 69 doi:10.7567/jjaps.20s1.69
 
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