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Nishimura, Hiroshi, Matsuo, Seitaro (1991) Evaluation of the Electron Cyclotron Resonance Plasma Process Using a Microwave Twin-Lead Line Probe. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1767

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Reference TypeJournal (article/letter/editorial)
TitleEvaluation of the Electron Cyclotron Resonance Plasma Process Using a Microwave Twin-Lead Line Probe
JournalJapanese Journal of Applied Physics
AuthorsNishimura, HiroshiAuthor
Matsuo, SeitaroAuthor
Year1991 (October 1)Volume30
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.30.l1767Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID14996889Long-form Identifiermindat:1:5:14996889:0
GUID0
Full ReferenceNishimura, Hiroshi, Matsuo, Seitaro (1991) Evaluation of the Electron Cyclotron Resonance Plasma Process Using a Microwave Twin-Lead Line Probe. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1767
Plain TextNishimura, Hiroshi, Matsuo, Seitaro (1991) Evaluation of the Electron Cyclotron Resonance Plasma Process Using a Microwave Twin-Lead Line Probe. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1767
In(1991) Japanese Journal of Applied Physics Vol. 30. Japan Society of Applied Physics

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Watanabe, Iwao, Nishimura, Hiroshi, Matsuo, Seitaro (1995) Wave Propagation in a Cylindrical Electron Cyclotron Resonance Plasma Chamber. Japanese Journal of Applied Physics, 34. 3675-3682 doi:10.1143/jjap.34.3675
Nishimura, Hiroshi, Kiuchi, Mikiho, Matsuo, Seitaro (1993) Processing Uniformity Improvement by Magnetic Field Distribution Control in Electron Cyclotron Resonance Plasma Chamber. Japanese Journal of Applied Physics, 32. 322-326 doi:10.1143/jjap.32.322
Ono, Toshiro, Takahashi, Chiharu, Matsuo, Seitaro (1984) Electron Cyclotron Resonance Plasma Deposition Technique Using Raw Material Supply by Sputtering. Japanese Journal of Applied Physics, 23. doi:10.1143/jjap.23.l534
Jin, Yoshito, Tsuchizawa, Tai, Matsuo, Seitaro (1995) Neutral Stream Extraction from Electron Cyclotron Resonance Plasma by Using Parallel Magnetic Field. Japanese Journal of Applied Physics, 34. doi:10.1143/jjap.34.l465
Matsuo, Seitaro, Kiuchi, Mikiho (1983) Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma. Japanese Journal of Applied Physics, 22. doi:10.1143/jjap.22.l210
Amemiya, Hiroshi, Ishii, Shigeyuki, Shigueoka, Yoshyuki (1991) Multicusp Type Electron Cyclotron Resonance Ion Source for Plasma Processing. Japanese Journal of Applied Physics, 30. 376-384 doi:10.1143/jjap.30.376
Samukawa, Seiji, Nakamura, Tsuyoshi (1991) Dependence of Electron Cyclotron Resonance Plasma Characteristics on Magnetic Field Profiles. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1330
Nakagawa, Takahide (1991) Effect of Coating on the Plasma Chamber Wall in RIKEN Electron Cyclotron Resonance Ion Source. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l930
Samukawa, Seiji (1991) Dependence of Gate Oxide Breakdown Frequency on Ion Current Density Distributions during Electron Cyclotron Resonance Plasma Etching. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1902
Samukawa, Seiji, Nakagawa, Yukito, Ikeda, Kei (1991) Ion Current Density and Ion Energy Distributions at the Electron Cyclotron Resonance Position in the Electron Cyclotron Resonance Plasma. Japanese Journal of Applied Physics, 30. 423-427 doi:10.1143/jjap.30.423
Samukawa, Seiji, Nakamura, Tsuyoshi (1991) Dependence of Electron Cyclotron Resonance Plasma Characteristics on Magnetic Field Profiles. Japanese Journal of Applied Physics, 30. 3147-3153 doi:10.1143/jjap.30.3147
 
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