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Ito, Wataru, Shimada, Haruo, Imafuku, Muneyuki, Hashimoto, Misao (1991) Plasma Oxidation of Copper Thin Films. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1877

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Reference TypeJournal (article/letter/editorial)
TitlePlasma Oxidation of Copper Thin Films
JournalJapanese Journal of Applied Physics
AuthorsIto, WataruAuthor
Shimada, HaruoAuthor
Imafuku, MuneyukiAuthor
Hashimoto, MisaoAuthor
Year1991 (November 1)Volume30
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.30.l1877Search in ResearchGate
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Mindat Ref. ID14996927Long-form Identifiermindat:1:5:14996927:9
GUID0
Full ReferenceIto, Wataru, Shimada, Haruo, Imafuku, Muneyuki, Hashimoto, Misao (1991) Plasma Oxidation of Copper Thin Films. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1877
Plain TextIto, Wataru, Shimada, Haruo, Imafuku, Muneyuki, Hashimoto, Misao (1991) Plasma Oxidation of Copper Thin Films. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1877
In(1991) Japanese Journal of Applied Physics Vol. 30. Japan Society of Applied Physics

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Ito, Wataru, Shimada, Haruo, Ito, Satoshi (1990) Preparation of YBaCuO Films by Polarized Plasma Oxidation of Multilayered Films. Japanese Journal of Applied Physics, 29. doi:10.1143/jjap.29.l2203
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