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Kinoshita, Hiroo, Watanabe, Takeo (2000) Experimental Results Obtained using Extreme Ultraviolet Laboratory Tool at New SUBARU. Japanese Journal of Applied Physics, 39. 6771-6776 doi:10.1143/jjap.39.6771

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Reference TypeJournal (article/letter/editorial)
TitleExperimental Results Obtained using Extreme Ultraviolet Laboratory Tool at New SUBARU
JournalJapanese Journal of Applied Physics
AuthorsKinoshita, HirooAuthor
Watanabe, TakeoAuthor
Year2000 (December 30)Volume39
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.39.6771Search in ResearchGate
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Mindat Ref. ID15014795Long-form Identifiermindat:1:5:15014795:6
GUID0
Full ReferenceKinoshita, Hiroo, Watanabe, Takeo (2000) Experimental Results Obtained using Extreme Ultraviolet Laboratory Tool at New SUBARU. Japanese Journal of Applied Physics, 39. 6771-6776 doi:10.1143/jjap.39.6771
Plain TextKinoshita, Hiroo, Watanabe, Takeo (2000) Experimental Results Obtained using Extreme Ultraviolet Laboratory Tool at New SUBARU. Japanese Journal of Applied Physics, 39. 6771-6776 doi:10.1143/jjap.39.6771
In(2000) Japanese Journal of Applied Physics Vol. 39. Japan Society of Applied Physics

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Ohnishi, Ryuji, Watanabe, Takeo, Fukushima, Yasuyuki, Osugi, Masafumi, Kinoshita, Hiroo (2009) Transmission Measurement Using Extreme Ultraviolet Light for the Development of Extreme Ultraviolet Resist. Japanese Journal of Applied Physics, 48 (6) 6 doi:10.1143/jjap.48.06fa08
Osugi, Masafumi, Tanaka, Kazuumi, Sakaya, Noriyuki, Hamamoto, Kazuhiro, Watanabe, Takeo, Kinoshita, Hiroo (2008) Resolution Enhancement of Extreme Ultraviolet Microscope Using an Extreme Ultraviolet Beam Splitter. Japanese Journal of Applied Physics, 47 (6) 4872-4877 doi:10.1143/jjap.47.4872
Harada, Tetsuo, Nakasuji, Masato, Tokimasa, Akifumi, Watanabe, Takeo, Usui, Youichi, Kinoshita, Hiroo (2012) Defect Characterization of an Extreme-Ultraviolet Mask Using a Coherent Extreme-Ultraviolet Scatterometry Microscope. Japanese Journal of Applied Physics, 51. 6 doi:10.1143/jjap.51.06fb08
Niibe, Masahito, Watanabe, Takeo, Nii, Hajime, Tanaka, Takeshi, Kinoshita, Hiroo (2000) Contrast Measurement of Reflection Masks Fabricated from Cr and Ta Absorbers for Extreme Ultraviolet Lithography. Japanese Journal of Applied Physics, 39. 6815-6818 doi:10.1143/jjap.39.6815
Harada, Tetsuo, Nakasuji, Masato, Tada, Masaki, Nagata, Yutaka, Watanabe, Takeo, Kinoshita, Hiroo (2011) Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent Extreme-Ultraviolet Scatterometry Microscope at NewSUBARU. Japanese Journal of Applied Physics, 50 (6) 6 doi:10.1143/jjap.50.06gb03
Watanabe, Takeo, Hamamoto, Kazuhiro, Kinoshita, Hiroo, Hada, Hideo, Komano, Hiroshi (2004) Resist Outgassing Characteristics in Extreme Ultraviolet Lithography. Japanese Journal of Applied Physics, 43 (6) 3713-3717 doi:10.1143/jjap.43.3713
Watanabe, Takeo, Fukushima, Yasuyuki, Shiotani, Hideaki, Ohnishi, Ryuji, Suzuki, Shota, Kinoshita, Hiroo, Yusa, Shinichi (2007) Extreme Ultraviolet Resist Development at the University of Hyogo. Japanese Journal of Applied Physics, 46 (9) 6118-6123 doi:10.1143/jjap.46.6118
Kinoshita, Hiroo, Hamamoto, Kazuhiro, Sakaya, Nobuyuki, Hosoya, Morio, Watanabe, Takeo (2007) Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography. Japanese Journal of Applied Physics, 46 (9) 6113-6117 doi:10.1143/jjap.46.6113
Tanaka, Yuzuru, Watanabe, Takeo, Hamamoto, Kazuhiro, Kinoshita, Hiroo (2006) Development of Nanometer Resolution Focus Detector in Vacuum for Extreme Ultraviolet Microscope. Japanese Journal of Applied Physics, 45 (9) 7163-7166 doi:10.1143/jjap.45.7163
Murakami, Katsuhiko, Oshino, Tetsuya, Kinoshita, Hiroo, Watanabe, Takeo, Niibe, Masato, Ito, Masaaki, Oizumi, Hiroaki, Yamanashi, Hiromasa (1998) Ring-Field Extreme Ultraviolet Exposure System Using Aspherical Mirrors. Japanese Journal of Applied Physics, 37. 6750-6755 doi:10.1143/jjap.37.6750
Harada, Tetsuo, Nakasuji, Masato, Tokimasa, Akifumi, Watanabe, Takeo, Usui, Youichi, Kinoshita, Hiroo (2012) Defect Characterization of an Extreme-Ultraviolet Mask Using a Coherent Extreme-Ultraviolet Scatterometry Microscope. Japanese Journal of Applied Physics, 51 (6) 6 doi:10.7567/jjap.51.06fb08
 
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