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Shimizu, Tatsuo (2004) Staebler-Wronski Effect in Hydrogenated Amorphous Silicon and Related Alloy Films. Japanese Journal of Applied Physics, 43 (6) 3257-3268 doi:10.1143/jjap.43.3257

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Reference TypeJournal (article/letter/editorial)
TitleStaebler-Wronski Effect in Hydrogenated Amorphous Silicon and Related Alloy Films
JournalJapanese Journal of Applied Physics
AuthorsShimizu, TatsuoAuthor
Year2004 (June 9)Volume43
Issue6
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.43.3257Search in ResearchGate
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Mindat Ref. ID15023341Long-form Identifiermindat:1:5:15023341:3
GUID0
Full ReferenceShimizu, Tatsuo (2004) Staebler-Wronski Effect in Hydrogenated Amorphous Silicon and Related Alloy Films. Japanese Journal of Applied Physics, 43 (6) 3257-3268 doi:10.1143/jjap.43.3257
Plain TextShimizu, Tatsuo (2004) Staebler-Wronski Effect in Hydrogenated Amorphous Silicon and Related Alloy Films. Japanese Journal of Applied Physics, 43 (6) 3257-3268 doi:10.1143/jjap.43.3257
In(2004, June) Japanese Journal of Applied Physics Vol. 43 (6) Japan Society of Applied Physics

See Also

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Bautista, Ma. Lourdes B., Enomoto, Hiroyuki, Ozaki, Hajime (1989) Field-Effect Study of the Staebler-Wronski Effect in Hydrogenated Amorphous Silicon. Japanese Journal of Applied Physics, 28. 153-159 doi:10.1143/jjap.28.153
Tajima, Michio, Ohyama, Hideaki, Okushi, Hideyo, Yamasaki, Satoshi, Tanaka, Kazunobu (1989) The Staebler-Wronski Effect on Defect Luminescence in Hydrogenated Amorphous Silicon. Japanese Journal of Applied Physics, 28. doi:10.1143/jjap.28.l1086
Kumeda, Minoru, Shimizu, Tatsuo (1980) ESR in Hydrogenated Amorphous Silicon. Japanese Journal of Applied Physics, 19 (4) doi:10.1143/jjap.19.l197
Ishii, Nobuhiko, Kumeda, Minoru, Shimizu, Tatsuo (1985) A Model for the Staebler-Wronski Effect Based on Charged Impurities. Japanese Journal of Applied Physics, 24. doi:10.1143/jjap.24.l244
Shimizu, Tatsuo, Shimada, Masaki, Kumeda, Minoru (2001) Photocreated Defects in Very Thin Hydrogenated Amorphous Silicon Films. Japanese Journal of Applied Physics, 40. 6327-6328 doi:10.1143/jjap.40.6327
Morimoto, Akiharu, Kataoka, Toyotaka, Shimizu, Tatsuo (1985) Annealing Studies on Hydrogenated Amorphous Silicon-Tin Films. Japanese Journal of Applied Physics, 24. 1122-1129 doi:10.1143/jjap.24.1122
Kumeda, Minoru, Shimada, Masaki, Kimura, Susumu, Morimoto, Akiharu, Shimizu, Tatsuo (2003) Light-Intensity Dependence of Photocreated Defects in Hydrogenated Amorphous Silicon-Nitrogen Alloy Films. Japanese Journal of Applied Physics, 42. doi:10.1143/jjap.42.l255
Staebler, D. L., Wronski, C. R. (1980) Optically induced conductivity changes in dischargeā€produced hydrogenated amorphous silicon. Journal of Applied Physics, 51 (6). 3262-3268 doi:10.1063/1.328084
Zhou, Jiang-Huai, Kumeda, Minoru, Shimizu, Tatsuo (1995) Light-Induced ESR in Variously Treated Hydrogenated Amorphous Silicon. Japanese Journal of Applied Physics, 34. 3982-3986 doi:10.1143/jjap.34.3982
Uesugi, Takashi, Ihara, Hisanori, Matsumura, Hideki (1985) The Staebler-Wronski Effect in Hydro-Fluorinated Amorphous Silicon Prepared Using the Intermediate Species SiF2. Japanese Journal of Applied Physics, 24. 909-911 doi:10.1143/jjap.24.909
Yan, Hui, Morimoto, Akiharu, Kumeda, Minoru, Shimizu, Tatsuo (1991) Thermal Equilibration of Defect Density in Hydrogenated Amorphous Silicon-Germanium Alloys. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1235
 
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