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Ishikawa, Makoto, Yoshimura, Masamichi, Ueda, Kazuyuki (2005) Development of Four-Probe Microscopy for Electric Conductivity Measurement. Japanese Journal of Applied Physics, 44 (3) 1502-1503 doi:10.1143/jjap.44.1502

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Reference TypeJournal (article/letter/editorial)
TitleDevelopment of Four-Probe Microscopy for Electric Conductivity Measurement
JournalJapanese Journal of Applied Physics
AuthorsIshikawa, MakotoAuthor
Yoshimura, MasamichiAuthor
Ueda, KazuyukiAuthor
Year2005 (March 8)Volume44
Issue3
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.44.1502Search in ResearchGate
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Mindat Ref. ID15025218Long-form Identifiermindat:1:5:15025218:6
GUID0
Full ReferenceIshikawa, Makoto, Yoshimura, Masamichi, Ueda, Kazuyuki (2005) Development of Four-Probe Microscopy for Electric Conductivity Measurement. Japanese Journal of Applied Physics, 44 (3) 1502-1503 doi:10.1143/jjap.44.1502
Plain TextIshikawa, Makoto, Yoshimura, Masamichi, Ueda, Kazuyuki (2005) Development of Four-Probe Microscopy for Electric Conductivity Measurement. Japanese Journal of Applied Physics, 44 (3) 1502-1503 doi:10.1143/jjap.44.1502
In(2005, March) Japanese Journal of Applied Physics Vol. 44 (3) Japan Society of Applied Physics

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Ishikawa, Makoto, Yoshimura, Masamichi, Ueda, Kazuyuki (2002) Simultaneous Measurement of Topography and Contact Current by Contact Mode Atomic Force Microscopy with Carbon Nanotube Probe. Japanese Journal of Applied Physics, 41. 4908-4910 doi:10.1143/jjap.41.4908
Fukidome, Hirokazu, Yoshimura, Masamichi, Ueda, Kazuyuki (2005) Temperature-Dependent Contrasts of Lateralp+-nJunctions on H/Si(100) Imaged with Photoemission Electron Microscopy. Japanese Journal of Applied Physics, 44. doi:10.1143/jjap.44.l1417
Ueda, Kazuyuki, Ishikawa, Ken'ichi, Ogai, Keiko, Yoshimura, Masamichi (2000) Two-Dimensional Hydrogen Analysis of Hydrogen Storage Alloy Surface by Electron-Stimulated Desorption Microscopy. Japanese Journal of Applied Physics, 39. doi:10.1143/jjap.39.l315
Ueda, Kazuyuki, Ishikawa, Ken'ichi, Yoshimura, Masamichi (1997) Surface Analysis by Imaging of H+on Si Device Surface. Japanese Journal of Applied Physics, 36. 7696-7698 doi:10.1143/jjap.36.7696
Yoshimura, Masamichi, Jo, Sadaharu, Ueda, Kazuyuki (2003) Fabrication of Carbon Nanostructure onto the Apex of Scanning Tunneling Microscopy Probe by Chemical Vapor Deposition. Japanese Journal of Applied Physics, 42. 4841-4843 doi:10.1143/jjap.42.4841
Yoshimura, Masamichi, Tanaka, Kei, Ueda, Kazuyuki (2005) Microwave Plasma-Enhanced Chemical Vapor Deposition of Carbon Nanostructures Using Biological Molecules. Japanese Journal of Applied Physics, 44 (4) 1562-1563 doi:10.1143/jjap.44.1562
Ueda, Kazuyuki, Ishikawa, Ken'ichi, Yoshimura, Masamichi (1997) Two-Dimensional Hydrogen Analysis by Time-of-Flight-Type Electron-Stimulated Desorption Spectroscopy. Japanese Journal of Applied Physics, 36. doi:10.1143/jjap.36.l1254
Visikovskiy, Anton, Yoshimura, Masamichi, Ueda, Kazuyuki (2010) Scanning Tunneling Microscopy Study ofIn situHydrogenation of Si(110) Surface. Japanese Journal of Applied Physics, 49 (8) 8 doi:10.1143/jjap.49.08lb05
Tanaka, Kei, Yoshimura, Masamichi, Okamoto, Atsuto, Ueda, Kazuyuki (2005) Synthesis of Carbon Nanocoils by Two-step Growth Method Using Microwave Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 44. doi:10.1143/jjap.44.l1158
Ono, Izumi, Yoshimura, Masamichi, Ueda, Kazuyuki (1998) Scanning Tunneling Microscopy Study of Silicide Structure on Si(110) Surface. Japanese Journal of Applied Physics, 37. 7155-7157 doi:10.1143/jjap.37.7155
Yoshimura, Masamichi, An, Toshu, Ueda, Kazuyuki (2000) Observation of Si(110) Surfaces by High-Temperature Scanning Tunneling Microscopy. Japanese Journal of Applied Physics, 39. 4432-4434 doi:10.1143/jjap.39.4432
 
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