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Tanaka, Kei, Yoshimura, Masamichi, Okamoto, Atsuto, Ueda, Kazuyuki (2005) Synthesis of Carbon Nanocoils by Two-step Growth Method Using Microwave Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 44. doi:10.1143/jjap.44.l1158

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Reference TypeJournal (article/letter/editorial)
TitleSynthesis of Carbon Nanocoils by Two-step Growth Method Using Microwave Plasma-Enhanced Chemical Vapor Deposition
JournalJapanese Journal of Applied Physics
AuthorsTanaka, KeiAuthor
Yoshimura, MasamichiAuthor
Okamoto, AtsutoAuthor
Ueda, KazuyukiAuthor
Year2005 (August 26)Volume44
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.44.l1158Search in ResearchGate
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Mindat Ref. ID15024148Long-form Identifiermindat:1:5:15024148:7
GUID0
Full ReferenceTanaka, Kei, Yoshimura, Masamichi, Okamoto, Atsuto, Ueda, Kazuyuki (2005) Synthesis of Carbon Nanocoils by Two-step Growth Method Using Microwave Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 44. doi:10.1143/jjap.44.l1158
Plain TextTanaka, Kei, Yoshimura, Masamichi, Okamoto, Atsuto, Ueda, Kazuyuki (2005) Synthesis of Carbon Nanocoils by Two-step Growth Method Using Microwave Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 44. doi:10.1143/jjap.44.l1158
In(2005) Japanese Journal of Applied Physics Vol. 44. Japan Society of Applied Physics

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Tanaka, Kei, Yoshimura, Masamichi, Okamoto, Atsuto, Ueda, Kazuyuki (2005) Growth of Carbon Nanowalls on a SiO2Substrate by Microwave Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 44 (4) 2074-2076 doi:10.1143/jjap.44.2074
Yoshimura, Masamichi, Tanaka, Kei, Ueda, Kazuyuki (2005) Microwave Plasma-Enhanced Chemical Vapor Deposition of Carbon Nanostructures Using Biological Molecules. Japanese Journal of Applied Physics, 44 (4) 1562-1563 doi:10.1143/jjap.44.1562
Chiu, Chien-Chao, Yoshimura, Masamichi, Ueda, Kazuyuki (2008) Regrowth of Carbon Nanotube Array by Microwave Plasma-Enhanced Thermal Chemical Vapor Deposition. Japanese Journal of Applied Physics, 47 (4) 1952-1955 doi:10.1143/jjap.47.1952
Suzuki, Seiya, Chatterjee, Anindita, Cheng, Chia-Liang, Yoshimura, Masamichi (2011) Effect of Hydrogen on Carbon Nanowall Growth by Microwave Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 50. 1 doi:10.1143/jjap.50.01af08
Hayashi, Yasuaki, Watanabe, Yousuke, Ueda, Keisuke, Nishino, Shigehiro (2005) Analyses of Early Stages of Vertically Aligned Carbon Nanotube Growth by Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 44 (4) 1549-1553 doi:10.1143/jjap.44.1549
Yoshimura, Masamichi, Jo, Sadaharu, Ueda, Kazuyuki (2003) Fabrication of Carbon Nanostructure onto the Apex of Scanning Tunneling Microscopy Probe by Chemical Vapor Deposition. Japanese Journal of Applied Physics, 42. 4841-4843 doi:10.1143/jjap.42.4841
Hiramatsu, Mineo, Nagao, Hidetoshi, Taniguchi, Masaki, Amano, Hiroshi, Ando, Yoshinori, Hori, Masaru (2005) High-Rate Growth of Films of Dense, Aligned Double-Walled Carbon Nanotubes Using Microwave Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 44. doi:10.1143/jjap.44.l693
Suzuki, Seiya, Chatterjee, Anindita, Cheng, Chia-Liang, Yoshimura, Masamichi (2011) Effect of Hydrogen on Carbon Nanowall Growth by Microwave Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 50 (1) 1 doi:10.7567/jjap.50.01af08
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Fukidome, Hirokazu, Yoshimura, Masamichi, Ueda, Kazuyuki (2005) Temperature-Dependent Contrasts of Lateralp+-nJunctions on H/Si(100) Imaged with Photoemission Electron Microscopy. Japanese Journal of Applied Physics, 44. doi:10.1143/jjap.44.l1417
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