| Reference Type | Journal (article/letter/editorial) |
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| Title | Effect of Hydrogen on Carbon Nanowall Growth by Microwave Plasma-Enhanced Chemical Vapor Deposition |
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| Journal | Japanese Journal of Applied Physics |
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| Authors | Suzuki, Seiya | Author |
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| Chatterjee, Anindita | Author |
| Cheng, Chia-Liang | Author |
| Yoshimura, Masamichi | Author |
| Year | 2011 (January 1) | Volume | 50 |
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| Issue | 1 |
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| Publisher | Japan Society of Applied Physics |
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| DOI | doi:10.7567/jjap.50.01af08Search in ResearchGate |
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| Generate Citation Formats |
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| Mindat Ref. ID | 15036811 | Long-form Identifier | mindat:1:5:15036811:5 |
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| GUID | 0 |
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| Full Reference | Suzuki, Seiya, Chatterjee, Anindita, Cheng, Chia-Liang, Yoshimura, Masamichi (2011) Effect of Hydrogen on Carbon Nanowall Growth by Microwave Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 50 (1) 1 doi:10.7567/jjap.50.01af08 |
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| Plain Text | Suzuki, Seiya, Chatterjee, Anindita, Cheng, Chia-Liang, Yoshimura, Masamichi (2011) Effect of Hydrogen on Carbon Nanowall Growth by Microwave Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 50 (1) 1 doi:10.7567/jjap.50.01af08 |
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| In | (2011, January) Japanese Journal of Applied Physics Vol. 50 (1) Japan Society of Applied Physics |
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