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Chonan, Yasunori, Onuki, Jin, Nagano, Takahiro, Khoo, Khyoupin, Aoyama, Takashi, Akahoshi, Haruo, Haba, Toshio, Saito, Tatsuyuki (2006) Filling 80-nm-Wide and High-Aspect-Ratio Trench with Pulse Wave Copper Electroplating and Observation of the Microstructure. Japanese Journal of Applied Physics, 45 (11) 8604-8607 doi:10.1143/jjap.45.8604

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Reference TypeJournal (article/letter/editorial)
TitleFilling 80-nm-Wide and High-Aspect-Ratio Trench with Pulse Wave Copper Electroplating and Observation of the Microstructure
JournalJapanese Journal of Applied Physics
AuthorsChonan, YasunoriAuthor
Onuki, JinAuthor
Nagano, TakahiroAuthor
Khoo, KhyoupinAuthor
Aoyama, TakashiAuthor
Akahoshi, HaruoAuthor
Haba, ToshioAuthor
Saito, TatsuyukiAuthor
Year2006 (November 8)Volume45
Issue11
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.45.8604Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID15027219Long-form Identifiermindat:1:5:15027219:1
GUID0
Full ReferenceChonan, Yasunori, Onuki, Jin, Nagano, Takahiro, Khoo, Khyoupin, Aoyama, Takashi, Akahoshi, Haruo, Haba, Toshio, Saito, Tatsuyuki (2006) Filling 80-nm-Wide and High-Aspect-Ratio Trench with Pulse Wave Copper Electroplating and Observation of the Microstructure. Japanese Journal of Applied Physics, 45 (11) 8604-8607 doi:10.1143/jjap.45.8604
Plain TextChonan, Yasunori, Onuki, Jin, Nagano, Takahiro, Khoo, Khyoupin, Aoyama, Takashi, Akahoshi, Haruo, Haba, Toshio, Saito, Tatsuyuki (2006) Filling 80-nm-Wide and High-Aspect-Ratio Trench with Pulse Wave Copper Electroplating and Observation of the Microstructure. Japanese Journal of Applied Physics, 45 (11) 8604-8607 doi:10.1143/jjap.45.8604
In(2006, November) Japanese Journal of Applied Physics Vol. 45 (11) Japan Society of Applied Physics

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