Kagamitani, Yuji, Ehrentraut, Dirk, Yoshikawa, Akira, Hoshino, Naruhiro, Fukuda, Tsuguo, Kawabata, Shinichiro, Inaba, Katsuhiko (2006) Ammonothermal Epitaxy of Thick GaN Film Using NH4Cl Mineralizer. Japanese Journal of Applied Physics, 45 (5) 4018-4020 doi:10.1143/jjap.45.4018
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Ammonothermal Epitaxy of Thick GaN Film Using NH4Cl Mineralizer | ||
| Journal | Japanese Journal of Applied Physics | ||
| Authors | Kagamitani, Yuji | Author | |
| Ehrentraut, Dirk | Author | ||
| Yoshikawa, Akira | Author | ||
| Hoshino, Naruhiro | Author | ||
| Fukuda, Tsuguo | Author | ||
| Kawabata, Shinichiro | Author | ||
| Inaba, Katsuhiko | Author | ||
| Year | 2006 (May 9) | Volume | 45 |
| Issue | 5 | ||
| Publisher | Japan Society of Applied Physics | ||
| DOI | doi:10.1143/jjap.45.4018Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 15028086 | Long-form Identifier | mindat:1:5:15028086:8 |
| GUID | 0 | ||
| Full Reference | Kagamitani, Yuji, Ehrentraut, Dirk, Yoshikawa, Akira, Hoshino, Naruhiro, Fukuda, Tsuguo, Kawabata, Shinichiro, Inaba, Katsuhiko (2006) Ammonothermal Epitaxy of Thick GaN Film Using NH4Cl Mineralizer. Japanese Journal of Applied Physics, 45 (5) 4018-4020 doi:10.1143/jjap.45.4018 | ||
| Plain Text | Kagamitani, Yuji, Ehrentraut, Dirk, Yoshikawa, Akira, Hoshino, Naruhiro, Fukuda, Tsuguo, Kawabata, Shinichiro, Inaba, Katsuhiko (2006) Ammonothermal Epitaxy of Thick GaN Film Using NH4Cl Mineralizer. Japanese Journal of Applied Physics, 45 (5) 4018-4020 doi:10.1143/jjap.45.4018 | ||
| In | (2006, May) Japanese Journal of Applied Physics Vol. 45 (5) Japan Society of Applied Physics | ||
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