Oshima, Takayoshi, Okuno, Takeya, Arai, Naoki, Kobayashi, Yasushi, Fujita, Shizuo (2009) Wet Etching of β-Ga2O3Substrates. Japanese Journal of Applied Physics, 48 (4) 40208 doi:10.1143/jjap.48.040208
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Wet Etching of β-Ga2O3Substrates | ||
Journal | Japanese Journal of Applied Physics | ||
Authors | Oshima, Takayoshi | Author | |
Okuno, Takeya | Author | ||
Arai, Naoki | Author | ||
Kobayashi, Yasushi | Author | ||
Fujita, Shizuo | Author | ||
Year | 2009 (April 6) | Volume | 48 |
Issue | 4 | ||
Publisher | Japan Society of Applied Physics | ||
DOI | doi:10.1143/jjap.48.040208Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 15033478 | Long-form Identifier | mindat:1:5:15033478:3 |
GUID | 0 | ||
Full Reference | Oshima, Takayoshi, Okuno, Takeya, Arai, Naoki, Kobayashi, Yasushi, Fujita, Shizuo (2009) Wet Etching of β-Ga2O3Substrates. Japanese Journal of Applied Physics, 48 (4) 40208 doi:10.1143/jjap.48.040208 | ||
Plain Text | Oshima, Takayoshi, Okuno, Takeya, Arai, Naoki, Kobayashi, Yasushi, Fujita, Shizuo (2009) Wet Etching of β-Ga2O3Substrates. Japanese Journal of Applied Physics, 48 (4) 40208 doi:10.1143/jjap.48.040208 | ||
In | (2009, April) Japanese Journal of Applied Physics Vol. 48 (4) Japan Society of Applied Physics |
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