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Ogane, Akiyoshi, Kitiyanan, Athapol, Uraoka, Yukiharu, Fuyuki, Takashi (2009) High-Pressure Water Vapor Heat Treatment for Enhancement of SiOxor SiNxPassivation Layers of Silicon Solar Cells. Japanese Journal of Applied Physics, 48 (6) 66504 doi:10.1143/jjap.48.066504

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Reference TypeJournal (article/letter/editorial)
TitleHigh-Pressure Water Vapor Heat Treatment for Enhancement of SiOxor SiNxPassivation Layers of Silicon Solar Cells
JournalJapanese Journal of Applied Physics
AuthorsOgane, AkiyoshiAuthor
Kitiyanan, AthapolAuthor
Uraoka, YukiharuAuthor
Fuyuki, TakashiAuthor
Year2009 (June 22)Volume48
Issue6
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.48.066504Search in ResearchGate
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Mindat Ref. ID15033900Long-form Identifiermindat:1:5:15033900:9
GUID0
Full ReferenceOgane, Akiyoshi, Kitiyanan, Athapol, Uraoka, Yukiharu, Fuyuki, Takashi (2009) High-Pressure Water Vapor Heat Treatment for Enhancement of SiOxor SiNxPassivation Layers of Silicon Solar Cells. Japanese Journal of Applied Physics, 48 (6) 66504 doi:10.1143/jjap.48.066504
Plain TextOgane, Akiyoshi, Kitiyanan, Athapol, Uraoka, Yukiharu, Fuyuki, Takashi (2009) High-Pressure Water Vapor Heat Treatment for Enhancement of SiOxor SiNxPassivation Layers of Silicon Solar Cells. Japanese Journal of Applied Physics, 48 (6) 66504 doi:10.1143/jjap.48.066504
In(2009, June) Japanese Journal of Applied Physics Vol. 48 (6) Japan Society of Applied Physics

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