Shima, Shohei, Wada, Yutaka, Tokushige, Katsuhiko, Fukunaga, Akira, Tsujimura, Manabu (2010) Analysis on Copper Photocorrosion Induced by Illuminance in Chemical Mechanical Planarization Equipment Using Photodiode and Quartz Crystal Microbalance. Japanese Journal of Applied Physics, 49 (5) 5 doi:10.1143/jjap.49.05ff05
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Analysis on Copper Photocorrosion Induced by Illuminance in Chemical Mechanical Planarization Equipment Using Photodiode and Quartz Crystal Microbalance | ||
Journal | Japanese Journal of Applied Physics | ||
Authors | Shima, Shohei | Author | |
Wada, Yutaka | Author | ||
Tokushige, Katsuhiko | Author | ||
Fukunaga, Akira | Author | ||
Tsujimura, Manabu | Author | ||
Year | 2010 (May 20) | Volume | 49 |
Issue | 5 | ||
Publisher | Japan Society of Applied Physics | ||
DOI | doi:10.1143/jjap.49.05ff05Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 15035566 | Long-form Identifier | mindat:1:5:15035566:5 |
GUID | 0 | ||
Full Reference | Shima, Shohei, Wada, Yutaka, Tokushige, Katsuhiko, Fukunaga, Akira, Tsujimura, Manabu (2010) Analysis on Copper Photocorrosion Induced by Illuminance in Chemical Mechanical Planarization Equipment Using Photodiode and Quartz Crystal Microbalance. Japanese Journal of Applied Physics, 49 (5) 5 doi:10.1143/jjap.49.05ff05 | ||
Plain Text | Shima, Shohei, Wada, Yutaka, Tokushige, Katsuhiko, Fukunaga, Akira, Tsujimura, Manabu (2010) Analysis on Copper Photocorrosion Induced by Illuminance in Chemical Mechanical Planarization Equipment Using Photodiode and Quartz Crystal Microbalance. Japanese Journal of Applied Physics, 49 (5) 5 doi:10.1143/jjap.49.05ff05 | ||
In | (2010, May) Japanese Journal of Applied Physics Vol. 49 (5) Japan Society of Applied Physics |
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