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Goto, Tetsuya, Seki, Nobuaki, Shirai, Yasuyuki, Ohmi, Tadahiro (2011) Study of the Reflectivity of Silver Films Deposited by Radio Frequency and Direct Current Coupled Magnetron Sputtering. Japanese Journal of Applied Physics, 50. 15801 doi:10.1143/jjap.50.015801

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Reference TypeJournal (article/letter/editorial)
TitleStudy of the Reflectivity of Silver Films Deposited by Radio Frequency and Direct Current Coupled Magnetron Sputtering
JournalJapanese Journal of Applied Physics
AuthorsGoto, TetsuyaAuthor
Seki, NobuakiAuthor
Shirai, YasuyukiAuthor
Ohmi, TadahiroAuthor
Year2011 (January 20)Volume50
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.50.015801Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID15036340Long-form Identifiermindat:1:5:15036340:0
GUID0
Full ReferenceGoto, Tetsuya, Seki, Nobuaki, Shirai, Yasuyuki, Ohmi, Tadahiro (2011) Study of the Reflectivity of Silver Films Deposited by Radio Frequency and Direct Current Coupled Magnetron Sputtering. Japanese Journal of Applied Physics, 50. 15801 doi:10.1143/jjap.50.015801
Plain TextGoto, Tetsuya, Seki, Nobuaki, Shirai, Yasuyuki, Ohmi, Tadahiro (2011) Study of the Reflectivity of Silver Films Deposited by Radio Frequency and Direct Current Coupled Magnetron Sputtering. Japanese Journal of Applied Physics, 50. 15801 doi:10.1143/jjap.50.015801
In(2011) Japanese Journal of Applied Physics Vol. 50. Japan Society of Applied Physics

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Goto, Tetsuya, Seki, Nobuaki, Shirai, Yasuyuki, Ohmi, Tadahiro (2011) Study of the Reflectivity of Silver Films Deposited by Radio Frequency and Direct Current Coupled Magnetron Sputtering. Japanese Journal of Applied Physics, 50 (1) 15801 doi:10.7567/jjap.50.015801
Hiroe, Akihiko, Goto, Tetsuya, Teramoto, Akinobu, Ohmi, Tadahiro (2009) Deposition of Microcrystalline Si1-xGexby RF Magnetron Sputtering on SiO2Substrates. Japanese Journal of Applied Physics, 48 (4) 4 doi:10.1143/jjap.48.04c124
Mizuno, Masao (2011) Photoluminescence of ZnS–SiO$_{2}$:Ce Thin Films Deposited by Magnetron Sputtering. Japanese Journal of Applied Physics, 50. 128002 doi:10.1143/jjap.50.128002
Hidaka, Atsushi, Yamashita, Satoru, Ishii, Hidekazu, Kato, Takeyoshi, Tanahashi, Naoki, Kitano, Masafumi, Goto, Tetsuya, Teramoto, Akinobu, Shirai, Yasuyuki, Ohmi, Tadahiro (2005) Adsorption Behavior of Various Fluorocarbon Gases on Silicon Wafer Surface. Japanese Journal of Applied Physics, 44 (4) 2245-2251 doi:10.1143/jjap.44.2245
Watanuki, Kohei, Inokuchi, Atsutoshi, Banba, Akinori, Suzuki, Hirokazu, Koike, Tadashi, Adachi, Tatsuhiko, Goto, Tetsuya, Teramoto, Akinobu, Shirai, Yasuyuki, Sugawa, Shigetoshi, Ohmi, Tadahiro (2010) Electrical Properties of Metal-Oxide-Containing SiO2Films Formed by Organosiloxane Sol–Gel Precursor. Japanese Journal of Applied Physics, 49 (11) 111503 doi:10.1143/jjap.49.111503
Nomoto, Junichi, Makino, Hisao, Yamamoto, Tetsuya (2015) Carrier mobility of highly transparent conductive Al-doped ZnO polycrystalline films deposited by radio-frequency, direct-current, and radio-frequency-superimposed direct-current magnetron sputtering: Grain boundary effect and scattering in the grain bulk. Journal of Applied Physics, 117 (4). 45304pp. doi:10.1063/1.4906353
Morishita, Sadaharu, Goto, Tetsuya, Shirai, Yasuyuki, Ohmi, Tadahiro (2012) Gas Flow Characteristics in a Plasma Process Chamber and Proposal of New Pulse-Controlled Gas Injection Method Using Interference Matrix Operation for Rapid Stabilization of Gas Pressure. Japanese Journal of Applied Physics, 51 (1) 16001 doi:10.1143/jjap.51.016001
Ishizuka, Shogo, Kato, Shinya, Maruyama, Takahiro, Akimoto, Katsuhiro (2001) Nitrogen Doping into Cu2O Thin Films Deposited by Reactive Radio-Frequency Magnetron Sputtering. Japanese Journal of Applied Physics, 40. 2765-2768 doi:10.1143/jjap.40.2765
Imamiya, Yuji, Kanno, Isaku, Yokokawa, Ryuji, Kotera, Hidetoshi (2011) Multilayer Thin-Film Capacitor Fabricated by Radio-Frequency Magnetron Sputtering. Japanese Journal of Applied Physics, 50 (9) 9 doi:10.1143/jjap.50.09na01
Nagase, Masaaki, Kitano, Masafumi, Shirai, Yasuyuki, Ohmi, Tadahiro (2001) Precise Control of Gas Concentration Ratio in Process Chamber. Japanese Journal of Applied Physics, 40. 5168-5172 doi:10.1143/jjap.40.5168
Yagi, Takashi, Oka, Nobuto, Okabe, Takashi, Taketoshi, Naoyuki, Baba, Tetsuya, Shigesato, Yuzo (2011) Effect of Oxygen Impurities on Thermal Diffusivity of AlN Thin Films Deposited by Reactive RF Magnetron Sputtering. Japanese Journal of Applied Physics, 50 (11) 11 doi:10.1143/jjap.50.11rb01
 
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