Huang, Sen, Yang, Shu, Roberts, John, Chen, Kevin J. (2011) Threshold Voltage Instability in Al$_{2}$O$_{3}$/GaN/AlGaN/GaN Metal–Insulator–Semiconductor High-Electron Mobility Transistors. Japanese Journal of Applied Physics, 50. 110202 doi:10.1143/jjap.50.110202
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Threshold Voltage Instability in Al$_{2}$O$_{3}$/GaN/AlGaN/GaN Metal–Insulator–Semiconductor High-Electron Mobility Transistors | ||
Journal | Japanese Journal of Applied Physics | ||
Authors | Huang, Sen | Author | |
Yang, Shu | Author | ||
Roberts, John | Author | ||
Chen, Kevin J. | Author | ||
Year | 2011 (October 25) | Volume | 50 |
Publisher | Japan Society of Applied Physics | ||
DOI | doi:10.1143/jjap.50.110202Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 15036596 | Long-form Identifier | mindat:1:5:15036596:1 |
GUID | 0 | ||
Full Reference | Huang, Sen, Yang, Shu, Roberts, John, Chen, Kevin J. (2011) Threshold Voltage Instability in Al$_{2}$O$_{3}$/GaN/AlGaN/GaN Metal–Insulator–Semiconductor High-Electron Mobility Transistors. Japanese Journal of Applied Physics, 50. 110202 doi:10.1143/jjap.50.110202 | ||
Plain Text | Huang, Sen, Yang, Shu, Roberts, John, Chen, Kevin J. (2011) Threshold Voltage Instability in Al$_{2}$O$_{3}$/GaN/AlGaN/GaN Metal–Insulator–Semiconductor High-Electron Mobility Transistors. Japanese Journal of Applied Physics, 50. 110202 doi:10.1143/jjap.50.110202 | ||
In | (2011) Japanese Journal of Applied Physics Vol. 50. Japan Society of Applied Physics |
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