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Moriki, Kazunori, Yumoto, Motoshige (2011) Photoluminescence of Polymer Film Fabricated by Plasma-Enhanced Chemical Vapor Deposition from Mixture of Benzene and Cyclohexene. Japanese Journal of Applied Physics, 50. 112601 doi:10.1143/jjap.50.112601

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Reference TypeJournal (article/letter/editorial)
TitlePhotoluminescence of Polymer Film Fabricated by Plasma-Enhanced Chemical Vapor Deposition from Mixture of Benzene and Cyclohexene
JournalJapanese Journal of Applied Physics
AuthorsMoriki, KazunoriAuthor
Yumoto, MotoshigeAuthor
Year2011 (October 27)Volume50
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.50.112601Search in ResearchGate
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Mindat Ref. ID15036616Long-form Identifiermindat:1:5:15036616:6
GUID0
Full ReferenceMoriki, Kazunori, Yumoto, Motoshige (2011) Photoluminescence of Polymer Film Fabricated by Plasma-Enhanced Chemical Vapor Deposition from Mixture of Benzene and Cyclohexene. Japanese Journal of Applied Physics, 50. 112601 doi:10.1143/jjap.50.112601
Plain TextMoriki, Kazunori, Yumoto, Motoshige (2011) Photoluminescence of Polymer Film Fabricated by Plasma-Enhanced Chemical Vapor Deposition from Mixture of Benzene and Cyclohexene. Japanese Journal of Applied Physics, 50. 112601 doi:10.1143/jjap.50.112601
In(2011) Japanese Journal of Applied Physics Vol. 50. Japan Society of Applied Physics

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Moriki, Kazunori, Yumoto, Motoshige (2011) Photoluminescence of Polymer Film Fabricated by Plasma-Enhanced Chemical Vapor Deposition from Mixture of Benzene and Cyclohexene. Japanese Journal of Applied Physics, 50 (11) 112601 doi:10.7567/jjap.50.112601
Shirai, Hajime, Fujimura, Yukihiro (2002) Photoluminesence Properties of Nanocrystalline Si Dots Fabricated by RF Plasma-Enhanced Chemical Vapor Deposition of SiCl4 and H2 Mixture. Japanese Journal of Applied Physics, 41. doi:10.1143/jjap.41.l1161
Jung, Donggeun, Pang, Heesuk, Park, Jung-Ho, Park, Yung Woo, Son, Yongkeun (1999) Photoluminescence and Electroluminescence from Polymer-Like Organic Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition Using Para-Xylene as Precursor. Japanese Journal of Applied Physics, 38. doi:10.1143/jjap.38.l84
Suzuki, Seiya, Chatterjee, Anindita, Cheng, Chia-Liang, Yoshimura, Masamichi (2011) Effect of Hydrogen on Carbon Nanowall Growth by Microwave Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 50. 1 doi:10.1143/jjap.50.01af08
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Suzuki, Keigo, Kijima, Kazunori (2005) Dielectric Properties of BaTiO3Films Prepared by RF-Plasma Chemical Vapor Deposition. Japanese Journal of Applied Physics, 44 (12) 8528-8535 doi:10.1143/jjap.44.8528
Shirai, Hajime, Seri, Yasuhiro, Jia, Haijun, Kurosaki, Ken-ichi (2003) Nanocrystalline Silicon Dots Fabricated by Pulse RF Plasma-Enhanced Chemical Vapor Deposition of SiCl4-and-H2Mixture. Japanese Journal of Applied Physics, 42. doi:10.1143/jjap.42.l1191
Ito, Tetsuji, Hashimoto, Koji, Shirai, Hajime (2003) Surface Chemistry of Si:H:Cl Film Formation by RF Plasma-Enhanced Chemical Vapor Deposition of SiH2Cl2and SiCl4. Japanese Journal of Applied Physics, 42. doi:10.1143/jjap.42.l1119
Kurosaki, Ken-ichi, Hashimoto, Koji, Nakao, Aiko, Shirai, Hajime (2003) Photoluminescence and Optical Characterizations of Nanocrystalline Silicon Dots Formed by Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 42. 6296-6302 doi:10.1143/jjap.42.6296
Takechi, Kazushige, Takagi, Tomoko, Kaneko, Setsuo (1997) Performance of a-Si:H Thin Film Transistors Fabricated by Very High Frequency Discharge Silane Plasma Chemical Vapor Deposition. Japanese Journal of Applied Physics, 36. 6269-6275 doi:10.1143/jjap.36.6269
Kato, Isamu, Matsumoto, Takayuki, Agnihotri, O. P. (2001) Photoluminescence from Thermally Oxidized Hydrogenated Amorphous Silicon Nanoball Films Fabricated by Double-Tubed-Coaxial-Line-Type Microwave Plasma Chemical Vapor Deposition System. Japanese Journal of Applied Physics, 40. 6862-6867 doi:10.1143/jjap.40.6862
 
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