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Moriki, Kazunori, Yumoto, Motoshige (2011) Photoluminescence of Polymer Film Fabricated by Plasma-Enhanced Chemical Vapor Deposition from Mixture of Benzene and Cyclohexene. Japanese Journal of Applied Physics, 50 (11) 112601 doi:10.7567/jjap.50.112601

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Reference TypeJournal (article/letter/editorial)
TitlePhotoluminescence of Polymer Film Fabricated by Plasma-Enhanced Chemical Vapor Deposition from Mixture of Benzene and Cyclohexene
JournalJapanese Journal of Applied Physics
AuthorsMoriki, KazunoriAuthor
Yumoto, MotoshigeAuthor
Year2011 (November 1)Volume50
Issue11
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.50.112601Search in ResearchGate
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Mindat Ref. ID15037192Long-form Identifiermindat:1:5:15037192:4
GUID0
Full ReferenceMoriki, Kazunori, Yumoto, Motoshige (2011) Photoluminescence of Polymer Film Fabricated by Plasma-Enhanced Chemical Vapor Deposition from Mixture of Benzene and Cyclohexene. Japanese Journal of Applied Physics, 50 (11) 112601 doi:10.7567/jjap.50.112601
Plain TextMoriki, Kazunori, Yumoto, Motoshige (2011) Photoluminescence of Polymer Film Fabricated by Plasma-Enhanced Chemical Vapor Deposition from Mixture of Benzene and Cyclohexene. Japanese Journal of Applied Physics, 50 (11) 112601 doi:10.7567/jjap.50.112601
In(2011, November) Japanese Journal of Applied Physics Vol. 50 (11) Japan Society of Applied Physics

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Moriki, Kazunori, Yumoto, Motoshige (2011) Photoluminescence of Polymer Film Fabricated by Plasma-Enhanced Chemical Vapor Deposition from Mixture of Benzene and Cyclohexene. Japanese Journal of Applied Physics, 50. 112601 doi:10.1143/jjap.50.112601
Shirai, Hajime, Fujimura, Yukihiro (2002) Photoluminesence Properties of Nanocrystalline Si Dots Fabricated by RF Plasma-Enhanced Chemical Vapor Deposition of SiCl4 and H2 Mixture. Japanese Journal of Applied Physics, 41. doi:10.1143/jjap.41.l1161
Suzuki, Seiya, Chatterjee, Anindita, Cheng, Chia-Liang, Yoshimura, Masamichi (2011) Effect of Hydrogen on Carbon Nanowall Growth by Microwave Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 50 (1) 1 doi:10.7567/jjap.50.01af08
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Nozaki, Tomohiro, Karatsu, Takuya, Yoshida, Shinpei, Okazaki, Ken (2011) Parametric Study for Selective Growth of Single-Walled Carbon Nanotubes in Plasma Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 50 (1) 1 doi:10.7567/jjap.50.01af03
Terasawa, Tomo-o, Saiki, Koichiro (2012) Synthesis of Nitrogen-Doped Graphene by Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 51 (5) 55101 doi:10.7567/jjap.51.055101
Takenaka, Kosuke, Okumura, Yusuke, Setsuhara, Yuichi (2012) Low-Temperature Deposition of Zinc Oxide Film by Plasma-Assisted Mist Chemical Vapor Deposition. Japanese Journal of Applied Physics, 51 (8) 8 doi:10.7567/jjap.51.08hf05
Chao, Chung-Hua, Wei, Da-Hua (2014) Growth of non-polar ZnO thin films with different working pressures by plasma enhanced chemical vapor deposition. Japanese Journal of Applied Physics, 53 (11) 11 doi:10.7567/jjap.53.11ra05
Kawamura, Yumi, Hattori, Nozomu, Miyatake, Naomasa, Horita, Masahiro, Uraoka, Yukiharu (2011) ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.7567/jjap.50.04df05
 
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