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Okada, Takeru, Fujimori, Jiro, Iida, Tetsuya (2011) Nanoimprint Molds with Circumferentially Aligned Patterns Fabricated by Liftoff Process. Japanese Journal of Applied Physics, 50. 126502 doi:10.1143/jjap.50.126502

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Reference TypeJournal (article/letter/editorial)
TitleNanoimprint Molds with Circumferentially Aligned Patterns Fabricated by Liftoff Process
JournalJapanese Journal of Applied Physics
AuthorsOkada, TakeruAuthor
Fujimori, JiroAuthor
Iida, TetsuyaAuthor
Year2011 (November 18)Volume50
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.50.126502Search in ResearchGate
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Mindat Ref. ID15036705Long-form Identifiermindat:1:5:15036705:7
GUID0
Full ReferenceOkada, Takeru, Fujimori, Jiro, Iida, Tetsuya (2011) Nanoimprint Molds with Circumferentially Aligned Patterns Fabricated by Liftoff Process. Japanese Journal of Applied Physics, 50. 126502 doi:10.1143/jjap.50.126502
Plain TextOkada, Takeru, Fujimori, Jiro, Iida, Tetsuya (2011) Nanoimprint Molds with Circumferentially Aligned Patterns Fabricated by Liftoff Process. Japanese Journal of Applied Physics, 50. 126502 doi:10.1143/jjap.50.126502
In(2011) Japanese Journal of Applied Physics Vol. 50. Japan Society of Applied Physics

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Okada, Takeru, Fujimori, Jiro, Iida, Tetsuya (2011) Nanoimprint Molds with Circumferentially Aligned Patterns Fabricated by Liftoff Process. Japanese Journal of Applied Physics, 50 (12) 126502 doi:10.7567/jjap.50.126502
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Shida, Noriyoshi, Higuchi, Takanobu, Suga, Keiji, Iida, Tetsuya (2003) Superlarge-Capacity Optical Disk with Multilayer Structure Fabricated Using a Photopolymer Sheet. Japanese Journal of Applied Physics, 42. 778-783 doi:10.1143/jjap.42.778
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