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Okada, Takeru, Fujimori, Jiro, Iida, Tetsuya (2011) Nanoimprint Molds with Circumferentially Aligned Patterns Fabricated by Liftoff Process. Japanese Journal of Applied Physics, 50 (12) 126502 doi:10.7567/jjap.50.126502

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Reference TypeJournal (article/letter/editorial)
TitleNanoimprint Molds with Circumferentially Aligned Patterns Fabricated by Liftoff Process
JournalJapanese Journal of Applied Physics
AuthorsOkada, TakeruAuthor
Fujimori, JiroAuthor
Iida, TetsuyaAuthor
Year2011 (December 1)Volume50
Issue12
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.50.126502Search in ResearchGate
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Mindat Ref. ID15037303Long-form Identifiermindat:1:5:15037303:4
GUID0
Full ReferenceOkada, Takeru, Fujimori, Jiro, Iida, Tetsuya (2011) Nanoimprint Molds with Circumferentially Aligned Patterns Fabricated by Liftoff Process. Japanese Journal of Applied Physics, 50 (12) 126502 doi:10.7567/jjap.50.126502
Plain TextOkada, Takeru, Fujimori, Jiro, Iida, Tetsuya (2011) Nanoimprint Molds with Circumferentially Aligned Patterns Fabricated by Liftoff Process. Japanese Journal of Applied Physics, 50 (12) 126502 doi:10.7567/jjap.50.126502
In(2011, December) Japanese Journal of Applied Physics Vol. 50 (12) Japan Society of Applied Physics

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Okada, Takeru, Fujimori, Jiro, Iida, Tetsuya (2011) Nanoimprint Molds with Circumferentially Aligned Patterns Fabricated by Liftoff Process. Japanese Journal of Applied Physics, 50. 126502 doi:10.1143/jjap.50.126502
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