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Noguchi, Daisuke, Eto, Tomohiro, Kodama, Kazuya, Higashimaru, Yukie, Fukudome, Shoji, Kawano, Yoshihiko, Sei, Fumihiro, Siono, Ichiro (2011) Technique for High-Rate, Low-Temperature Deposition of TiO2Photocatalytic Thin Film Using Radical-Assisted Sputtering. Japanese Journal of Applied Physics, 50 (1) 10204 doi:10.7567/jjap.50.010204

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Reference TypeJournal (article/letter/editorial)
TitleTechnique for High-Rate, Low-Temperature Deposition of TiO2Photocatalytic Thin Film Using Radical-Assisted Sputtering
JournalJapanese Journal of Applied Physics
AuthorsNoguchi, DaisukeAuthor
Eto, TomohiroAuthor
Kodama, KazuyaAuthor
Higashimaru, YukieAuthor
Fukudome, ShojiAuthor
Kawano, YoshihikoAuthor
Sei, FumihiroAuthor
Siono, IchiroAuthor
Year2011 (January 1)Volume50
Issue1
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.50.010204Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID15036734Long-form Identifiermindat:1:5:15036734:7
GUID0
Full ReferenceNoguchi, Daisuke, Eto, Tomohiro, Kodama, Kazuya, Higashimaru, Yukie, Fukudome, Shoji, Kawano, Yoshihiko, Sei, Fumihiro, Siono, Ichiro (2011) Technique for High-Rate, Low-Temperature Deposition of TiO2Photocatalytic Thin Film Using Radical-Assisted Sputtering. Japanese Journal of Applied Physics, 50 (1) 10204 doi:10.7567/jjap.50.010204
Plain TextNoguchi, Daisuke, Eto, Tomohiro, Kodama, Kazuya, Higashimaru, Yukie, Fukudome, Shoji, Kawano, Yoshihiko, Sei, Fumihiro, Siono, Ichiro (2011) Technique for High-Rate, Low-Temperature Deposition of TiO2Photocatalytic Thin Film Using Radical-Assisted Sputtering. Japanese Journal of Applied Physics, 50 (1) 10204 doi:10.7567/jjap.50.010204
In(2011, January) Japanese Journal of Applied Physics Vol. 50 (1) Japan Society of Applied Physics

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Noguchi, Daisuke, Eto, Tomohiro, Kodama, Kazuya, Higashimaru, Yukie, Fukudome, Shoji, Kawano, Yoshihiko, Sei, Fumihiro, Siono, Ichiro (2011) Technique for High-Rate, Low-Temperature Deposition of TiO2Photocatalytic Thin Film Using Radical-Assisted Sputtering. Japanese Journal of Applied Physics, 50. 10204 doi:10.1143/jjap.50.010204
Noguchi, Daisuke, Higashimaru, Yukie, Eto, Tomohiro, Kodama, Kazuya, Fukudome, Shoji, Kawano, Yoshihiko, Sei, Fumihiro, Siono, Ichiro (2012) Effect of Nucleation Layer of Photocatalytic TiO2Thin Film Prepared by Two-Step Deposition Using Radical-Assisted Sputtering. Japanese Journal of Applied Physics, 51 (4) 45504 doi:10.7567/jjap.51.045504
Noguchi, Daisuke, Higashimaru, Yukie, Eto, Tomohiro, Kodama, Kazuya, Fukudome, Shoji, Kawano, Yoshihiko, Sei, Fumihiro, Siono, Ichiro (2012) Effect of Nucleation Layer of Photocatalytic TiO$_{2}$ Thin Film Prepared by Two-Step Deposition Using Radical-Assisted Sputtering. Japanese Journal of Applied Physics, 51. 45504 doi:10.1143/jjap.51.045504
Noguchi, Daisuke, Higashimaru, Yukie, Eto, Tomohiro, Kodama, Kazuya, Fukudome, Shoji, Kawano, Yoshihiko, Sei, Fumihiro, Siono, Ichiro (2014) Structural control and photocatalytic properties of photocatalytic TiO2thin films prepared using two-step deposition including radical-assisted sputtering. Japanese Journal of Applied Physics, 53 (6) 65501 doi:10.7567/jjap.53.065501
Noguchi, Daisuke, Taneda, Hiroshi, Higashimaru, Yukie, Kawano, Yoshihiko, Sei, Fumihiro (2012) Ion Conductivity of Ta2O5Solid Electrolyte Thin Film Prepared by Combination Sputtering with Radio Frequency Oxygen Plasma Irradiation. Japanese Journal of Applied Physics, 51 (2) 25801 doi:10.7567/jjap.51.025801
Noguchi, Daisuke, Taneda, Hiroshi, Higashimaru, Yukie, Kawano, Yoshihiko, Sei, Fumihiro (2012) Ion Conductivity of Ta$_{2}$O$_{5}$ Solid Electrolyte Thin Film Prepared by Combination Sputtering with Radio Frequency Oxygen Plasma Irradiation. Japanese Journal of Applied Physics, 51. 25801 doi:10.1143/jjap.51.025801
Harada, Shun, Yoshino, Kenji, Fukudome, Syuji, Kawano, Yoshihiko, Sei, Fumihiro (2011) Growth of IrOx–SnOxFilms Deposited by Reactive Sputtering. Japanese Journal of Applied Physics, 50 (5) 5 doi:10.7567/jjap.50.05fb14
Harada, Shun, Yoshino, Kenji, Fukudome, Syuji, Kawano, Yoshihiko, Sei, Fumihiro (2011) Growth of IrOx–SnOxFilms Deposited by Reactive Sputtering. Japanese Journal of Applied Physics, 50 (5) 5 doi:10.1143/jjap.50.05fb14
Kakio, Shoji, Tsuchiya, Akinori, Nakagawa, Yasuhiko (2011) Deposition of Highly Oriented Ta2O5Piezoelectric Thin Films on Silicon for Fabricating Film Bulk Acoustic Resonator Structure by RF Magnetron Sputtering. Japanese Journal of Applied Physics, 50 (7) 7 doi:10.7567/jjap.50.07hd09
Simanullang, Marolop, Usami, Koichi, Noguchi, Tomohiro, Surawijaya, Akhmadi, Kodera, Tetsuo, Kawano, Yukio, Oda, Shunri (2014) Surface passivation of germanium nanowires using Al2O3and HfO2deposited via atomic layer deposition technique. Japanese Journal of Applied Physics, 53 (6) 6 doi:10.7567/jjap.53.06jg04
Tomiyama, Kazuya, Kobayashi, Yusuke, Tsuda, Mitsuru, Higuchi, Tohru (2011) Growth of Sc-Doped TiO2Thin Film by RF Magnetron Sputtering. Japanese Journal of Applied Physics, 50 (6) 65502 doi:10.7567/jjap.50.065502
 
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