Noguchi, Daisuke, Higashimaru, Yukie, Eto, Tomohiro, Kodama, Kazuya, Fukudome, Shoji, Kawano, Yoshihiko, Sei, Fumihiro, Siono, Ichiro (2012) Effect of Nucleation Layer of Photocatalytic TiO$_{2}$ Thin Film Prepared by Two-Step Deposition Using Radical-Assisted Sputtering. Japanese Journal of Applied Physics, 51. 45504 doi:10.1143/jjap.51.045504
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Effect of Nucleation Layer of Photocatalytic TiO$_{2}$ Thin Film Prepared by Two-Step Deposition Using Radical-Assisted Sputtering | ||
Journal | Japanese Journal of Applied Physics | ||
Authors | Noguchi, Daisuke | Author | |
Higashimaru, Yukie | Author | ||
Eto, Tomohiro | Author | ||
Kodama, Kazuya | Author | ||
Fukudome, Shoji | Author | ||
Kawano, Yoshihiko | Author | ||
Sei, Fumihiro | Author | ||
Siono, Ichiro | Author | ||
Year | 2012 (April 5) | Volume | 51 |
Publisher | Japan Society of Applied Physics | ||
DOI | doi:10.1143/jjap.51.045504Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 15040108 | Long-form Identifier | mindat:1:5:15040108:9 |
GUID | 0 | ||
Full Reference | Noguchi, Daisuke, Higashimaru, Yukie, Eto, Tomohiro, Kodama, Kazuya, Fukudome, Shoji, Kawano, Yoshihiko, Sei, Fumihiro, Siono, Ichiro (2012) Effect of Nucleation Layer of Photocatalytic TiO$_{2}$ Thin Film Prepared by Two-Step Deposition Using Radical-Assisted Sputtering. Japanese Journal of Applied Physics, 51. 45504 doi:10.1143/jjap.51.045504 | ||
Plain Text | Noguchi, Daisuke, Higashimaru, Yukie, Eto, Tomohiro, Kodama, Kazuya, Fukudome, Shoji, Kawano, Yoshihiko, Sei, Fumihiro, Siono, Ichiro (2012) Effect of Nucleation Layer of Photocatalytic TiO$_{2}$ Thin Film Prepared by Two-Step Deposition Using Radical-Assisted Sputtering. Japanese Journal of Applied Physics, 51. 45504 doi:10.1143/jjap.51.045504 | ||
In | (2012) Japanese Journal of Applied Physics Vol. 51. Japan Society of Applied Physics |
See Also
These are possibly similar items as determined by title/reference text matching only.