Fujiki, Jun, Haimoto, Takashi, Yasuda, Naoki, Koyama, Masato (2011) Dynamics of the Charge Centroid in Metal–Oxide–Nitride–Oxide–Silicon Memory Cells during Avalanche Injection and Fowler–Nordheim Injection Based on Incremental-Step-Pulse Programming. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.1143/jjap.50.04dd06
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Dynamics of the Charge Centroid in Metal–Oxide–Nitride–Oxide–Silicon Memory Cells during Avalanche Injection and Fowler–Nordheim Injection Based on Incremental-Step-Pulse Programming | ||
| Journal | Japanese Journal of Applied Physics | ||
| Authors | Fujiki, Jun | Author | |
| Haimoto, Takashi | Author | ||
| Yasuda, Naoki | Author | ||
| Koyama, Masato | Author | ||
| Year | 2011 (April 20) | Volume | 50 |
| Issue | 4 | ||
| Publisher | Japan Society of Applied Physics | ||
| DOI | doi:10.1143/jjap.50.04dd06Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 15037701 | Long-form Identifier | mindat:1:5:15037701:8 |
| GUID | 0 | ||
| Full Reference | Fujiki, Jun, Haimoto, Takashi, Yasuda, Naoki, Koyama, Masato (2011) Dynamics of the Charge Centroid in Metal–Oxide–Nitride–Oxide–Silicon Memory Cells during Avalanche Injection and Fowler–Nordheim Injection Based on Incremental-Step-Pulse Programming. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.1143/jjap.50.04dd06 | ||
| Plain Text | Fujiki, Jun, Haimoto, Takashi, Yasuda, Naoki, Koyama, Masato (2011) Dynamics of the Charge Centroid in Metal–Oxide–Nitride–Oxide–Silicon Memory Cells during Avalanche Injection and Fowler–Nordheim Injection Based on Incremental-Step-Pulse Programming. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.1143/jjap.50.04dd06 | ||
| In | (2011, April) Japanese Journal of Applied Physics Vol. 50 (4) Japan Society of Applied Physics | ||
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