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Koga, Kazunori, Matsunaga, Takeaki, Kim, Yeonwon, Nakahara, Kenta, Yamashita, Daisuke, Matsuzaki, Hidefumi, Kamataki, Kunihiro, Uchida, Giichiro, Itagaki, Naho, Shiratani, Masaharu (2012) Combinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition. Japanese Journal of Applied Physics, 51 (1) 1 doi:10.1143/jjap.51.01ad02

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Reference TypeJournal (article/letter/editorial)
TitleCombinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition
JournalJapanese Journal of Applied Physics
AuthorsKoga, KazunoriAuthor
Matsunaga, TakeakiAuthor
Kim, YeonwonAuthor
Nakahara, KentaAuthor
Yamashita, DaisukeAuthor
Matsuzaki, HidefumiAuthor
Kamataki, KunihiroAuthor
Uchida, GiichiroAuthor
Itagaki, NahoAuthor
Shiratani, MasaharuAuthor
Year2012 (January 20)Volume51
Issue1
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.51.01ad02Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID15041471Long-form Identifiermindat:1:5:15041471:3
GUID0
Full ReferenceKoga, Kazunori, Matsunaga, Takeaki, Kim, Yeonwon, Nakahara, Kenta, Yamashita, Daisuke, Matsuzaki, Hidefumi, Kamataki, Kunihiro, Uchida, Giichiro, Itagaki, Naho, Shiratani, Masaharu (2012) Combinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition. Japanese Journal of Applied Physics, 51 (1) 1 doi:10.1143/jjap.51.01ad02
Plain TextKoga, Kazunori, Matsunaga, Takeaki, Kim, Yeonwon, Nakahara, Kenta, Yamashita, Daisuke, Matsuzaki, Hidefumi, Kamataki, Kunihiro, Uchida, Giichiro, Itagaki, Naho, Shiratani, Masaharu (2012) Combinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition. Japanese Journal of Applied Physics, 51 (1) 1 doi:10.1143/jjap.51.01ad02
In(2012, January) Japanese Journal of Applied Physics Vol. 51 (1) Japan Society of Applied Physics

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