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Takeyama, Mayumi B., Noya, Atsushi (2012) Oxidation Characteristics of Thin Al–Mo Alloy Films with Various Compositions as Metal Capping Layer on Cu. Japanese Journal of Applied Physics, 51 (5) 5 doi:10.7567/jjap.51.05ea06

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Reference TypeJournal (article/letter/editorial)
TitleOxidation Characteristics of Thin Al–Mo Alloy Films with Various Compositions as Metal Capping Layer on Cu
JournalJapanese Journal of Applied Physics
AuthorsTakeyama, Mayumi B.Author
Noya, AtsushiAuthor
Year2012 (May 1)Volume51
Issue5
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.51.05ea06Search in ResearchGate
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Mindat Ref. ID15042689Long-form Identifiermindat:1:5:15042689:1
GUID0
Full ReferenceTakeyama, Mayumi B., Noya, Atsushi (2012) Oxidation Characteristics of Thin Al–Mo Alloy Films with Various Compositions as Metal Capping Layer on Cu. Japanese Journal of Applied Physics, 51 (5) 5 doi:10.7567/jjap.51.05ea06
Plain TextTakeyama, Mayumi B., Noya, Atsushi (2012) Oxidation Characteristics of Thin Al–Mo Alloy Films with Various Compositions as Metal Capping Layer on Cu. Japanese Journal of Applied Physics, 51 (5) 5 doi:10.7567/jjap.51.05ea06
In(2012, May) Japanese Journal of Applied Physics Vol. 51 (5) Japan Society of Applied Physics

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Takeyama, Mayumi B., Noya, Atsushi (2012) Oxidation Characteristics of Thin Al–Mo Alloy Films with Various Compositions as Metal Capping Layer on Cu. Japanese Journal of Applied Physics, 51. 5 doi:10.1143/jjap.51.05ea06
Takeyama, Mayumi B., Noya, Atsushi (2016) Application of Al–Nb alloy film to metal capping layer on Cu. Japanese Journal of Applied Physics, 55 (2) 2 doi:10.7567/jjap.55.02bc22
Takeyama, Mayumi, Noya, Atsushi, Taguchi, Masahiro, Ichikawa, Takaaki, Sasaki, Katsutaka (1996) Oxidation Characteristics of Al–Ta Thin Alloy Films as a Passivation Layer on Cu. Japanese Journal of Applied Physics, 35. 704-708 doi:10.1143/jjap.35.704
Ichikawa, Takaaki, Takeyama, Mayumi, Noya, Atsushi (1996) Oxidation Behavior of Ta Thin Films as a Passivation Layer Deposited on Cu. Japanese Journal of Applied Physics, 35. 1844-1845 doi:10.1143/jjap.35.1844
Takeyama, Mayumi B., Sato, Masaru, Sudoh, Hiroshi, Machida, Hideaki, Ito, Shun, Aoyagi, Eiji, Noya, Atsushi (2011) Atomic Layer Deposition of Thin VNxFilm from Tetrakis(diethylamido)vanadium Precursor. Japanese Journal of Applied Physics, 50 (5) 5 doi:10.7567/jjap.50.05ea06
Takeyama, Mayumi B., Sato, Masaru, Aoyagi, Eiji, Noya, Atsushi (2010) Reactively Sputtered Nanocrystalline ZrN Film as Extremely Thin Diffusion Barrier between Cu and SiO2. Japanese Journal of Applied Physics, 49 (5) 5 doi:10.1143/jjap.49.05fa06
Sato, Masaru, Takeyama, Mayumi B., Hayasaka, Yuichirou, Aoyagi, Eiji, Noya, Atsushi (2011) Barrier Properties of Thin ZrNxFilms Prepared by Radical-Assisted Surface Reaction. Japanese Journal of Applied Physics, 50 (5) 5 doi:10.7567/jjap.50.05ea07
Takeyama, Mayumi B., Sato, Masaru, Noya, Atsushi (2015) Thermally stable ZrN/Zr3N4bilayered barrier system for through-Si-via process. Japanese Journal of Applied Physics, 54 (5) 5 doi:10.7567/jjap.54.05ee02
Takeyama, Mayumi B., Sato, Masaru, Nakata, Yoshihiro, Kobayashi, Yasushi, Nakamura, Tomoji, Noya, Atsushi (2014) Characterization of silicon nitride thin films deposited by reactive sputtering and plasma-enhanced CVD at low temperatures. Japanese Journal of Applied Physics, 53 (5) 5 doi:10.7567/jjap.53.05ge01
Takeyama, Mayumi B., Sato, Masaru (2017) Growth of 〈111〉-oriented Cu layer on thin TaWN films. Japanese Journal of Applied Physics, 56 (7) 7 doi:10.7567/jjap.56.07kc03
Takeyama, Mayumi B., Sato, Masaru, Sudoh, Hiroshi, Machida, Hideaki, Ito, Shun, Aoyagi, Eiji, Noya, Atsushi (2011) Atomic Layer Deposition of Thin VNxFilm from Tetrakis(diethylamido)vanadium Precursor. Japanese Journal of Applied Physics, 50 (5) 5 doi:10.1143/jjap.50.05ea06
 
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