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Kikuchi, Yoshiyuki, Miyatani, Kotaro, Kobayashi, Yasuo, Kawamura, Kohei, Nemoto, Takenao, Nakamura, Masahiro, Matsumoto, Hirokazu, Ito, Azumi, Shirotori, Akihide, Nozawa, Toshihisa, Matsuoka, Takaaki (2012) Robust Ultralow-kDielectric (Fluorocarbon) Deposition by Microwave Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 51 (5) 5 doi:10.7567/jjap.51.05ec02

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Reference TypeJournal (article/letter/editorial)
TitleRobust Ultralow-kDielectric (Fluorocarbon) Deposition by Microwave Plasma-Enhanced Chemical Vapor Deposition
JournalJapanese Journal of Applied Physics
AuthorsKikuchi, YoshiyukiAuthor
Miyatani, KotaroAuthor
Kobayashi, YasuoAuthor
Kawamura, KoheiAuthor
Nemoto, TakenaoAuthor
Nakamura, MasahiroAuthor
Matsumoto, HirokazuAuthor
Ito, AzumiAuthor
Shirotori, AkihideAuthor
Nozawa, ToshihisaAuthor
Matsuoka, TakaakiAuthor
Year2012 (May 1)Volume51
Issue5
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.51.05ec02Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID15042695Long-form Identifiermindat:1:5:15042695:2
GUID0
Full ReferenceKikuchi, Yoshiyuki, Miyatani, Kotaro, Kobayashi, Yasuo, Kawamura, Kohei, Nemoto, Takenao, Nakamura, Masahiro, Matsumoto, Hirokazu, Ito, Azumi, Shirotori, Akihide, Nozawa, Toshihisa, Matsuoka, Takaaki (2012) Robust Ultralow-kDielectric (Fluorocarbon) Deposition by Microwave Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 51 (5) 5 doi:10.7567/jjap.51.05ec02
Plain TextKikuchi, Yoshiyuki, Miyatani, Kotaro, Kobayashi, Yasuo, Kawamura, Kohei, Nemoto, Takenao, Nakamura, Masahiro, Matsumoto, Hirokazu, Ito, Azumi, Shirotori, Akihide, Nozawa, Toshihisa, Matsuoka, Takaaki (2012) Robust Ultralow-kDielectric (Fluorocarbon) Deposition by Microwave Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 51 (5) 5 doi:10.7567/jjap.51.05ec02
In(2012, May) Japanese Journal of Applied Physics Vol. 51 (5) Japan Society of Applied Physics

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