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Lin, Chiung-Wei, Chiang, Yi-Tsung (2014) Tetragonal hafnium oxide film prepared by low-temperature oxidation. Japanese Journal of Applied Physics, 53 (11) 11 doi:10.7567/jjap.53.11ra07

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Reference TypeJournal (article/letter/editorial)
TitleTetragonal hafnium oxide film prepared by low-temperature oxidation
JournalJapanese Journal of Applied Physics
AuthorsLin, Chiung-WeiAuthor
Chiang, Yi-TsungAuthor
Year2014 (November 1)Volume53
Issue11
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.53.11ra07Search in ResearchGate
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Mindat Ref. ID15043514Long-form Identifiermindat:1:5:15043514:5
GUID0
Full ReferenceLin, Chiung-Wei, Chiang, Yi-Tsung (2014) Tetragonal hafnium oxide film prepared by low-temperature oxidation. Japanese Journal of Applied Physics, 53 (11) 11 doi:10.7567/jjap.53.11ra07
Plain TextLin, Chiung-Wei, Chiang, Yi-Tsung (2014) Tetragonal hafnium oxide film prepared by low-temperature oxidation. Japanese Journal of Applied Physics, 53 (11) 11 doi:10.7567/jjap.53.11ra07
In(2014, November) Japanese Journal of Applied Physics Vol. 53 (11) Japan Society of Applied Physics

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