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Tanaka, Akira, Katsuno, Hironobu (2011) Void-Free Cuprous Oxide Tube Prepared by Thermal Oxidation on Outside of Copper Tube. Japanese Journal of Applied Physics, 50 (11) 110205 doi:10.7567/jjap.50.110205

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Reference TypeJournal (article/letter/editorial)
TitleVoid-Free Cuprous Oxide Tube Prepared by Thermal Oxidation on Outside of Copper Tube
JournalJapanese Journal of Applied Physics
AuthorsTanaka, AkiraAuthor
Katsuno, HironobuAuthor
Year2011 (November 1)Volume50
Issue11
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.50.110205Search in ResearchGate
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Mindat Ref. ID15037175Long-form Identifiermindat:1:5:15037175:7
GUID0
Full ReferenceTanaka, Akira, Katsuno, Hironobu (2011) Void-Free Cuprous Oxide Tube Prepared by Thermal Oxidation on Outside of Copper Tube. Japanese Journal of Applied Physics, 50 (11) 110205 doi:10.7567/jjap.50.110205
Plain TextTanaka, Akira, Katsuno, Hironobu (2011) Void-Free Cuprous Oxide Tube Prepared by Thermal Oxidation on Outside of Copper Tube. Japanese Journal of Applied Physics, 50 (11) 110205 doi:10.7567/jjap.50.110205
In(2011, November) Japanese Journal of Applied Physics Vol. 50 (11) Japan Society of Applied Physics

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Tanaka, Akira, Katsuno, Hironobu (2011) Void-Free Cuprous Oxide Tube Prepared by Thermal Oxidation on Outside of Copper Tube. Japanese Journal of Applied Physics, 50. 110205 doi:10.1143/jjap.50.110205
Tanaka, Akira, Katsuno, Hironobu (2009) Formation of Bare Porous Surface on 6H-SiC Substrates by Photo-Electrochemical Etching. Japanese Journal of Applied Physics, 48 (12) 120217 doi:10.1143/jjap.48.120217
Udono, Haruhiko, Katsuno, Hironobu, Tanaka, Akira, Sukegawa, Tokuzo (1993) Conversion of GaAs Layer Grown on GaP Substrate to GaAsP in LPE System. Japanese Journal of Applied Physics, 32. 735 doi:10.7567/jjaps.32s3.735
Tanaka, Akira, Ataka, Tatsuya, Ohkura, Eiji, Katsuno, Hironobu (2004) Growth Modes of Silicon Carbide in Low-Temperature Liquid Phase Epitaxy. Japanese Journal of Applied Physics, 43 (11) 7670-7671 doi:10.1143/jjap.43.7670
Tanaka, Akira, Katsuno, Hironobu (2006) Heavily p-Type Silicon Carbide Thick Layer Growth by Low-Temperature Liquid Phase Epitaxy. Japanese Journal of Applied Physics, 45 (1) 32-35 doi:10.1143/jjap.45.32
Tanaka, Akira, Ota, Yuichi, Katsuno, Hironobu (2007) Current–Voltage Characteristics of p+–n SiC Junctions Fabricated by Low-Temperature Liquid Phase Epitaxy. Japanese Journal of Applied Physics, 46 (8) 5131-5132 doi:10.1143/jjap.46.5131
Lin, Chiung-Wei, Chiang, Yi-Tsung (2014) Tetragonal hafnium oxide film prepared by low-temperature oxidation. Japanese Journal of Applied Physics, 53 (11) 11 doi:10.7567/jjap.53.11ra07
Sukegawa, Tokuzo, Udono, Haruhiko, Kimura, Masakazu, Katsuno, Hironobu, Tanaka, Akira (1993) Conversion from GaAs to GaAsP by Annealing a GaAs Layer on GaP in Ga-As-P Solution. Japanese Journal of Applied Physics, 32. doi:10.1143/jjap.32.l1164
Akoshima, Megumi, Tanaka, Takashi, Endo, Satoshi, Baba, Tetsuya, Harada, Yoshio, Kojima, Yoshitaka, Kawasaki, Akira, Ono, Fumio (2011) Thermal Diffusivity Measurement for Thermal Spray Coating Attached to Substrate Using Laser Flash Method. Japanese Journal of Applied Physics, 50 (11) 11 doi:10.7567/jjap.50.11re01
Heya, Akira, Hasegawa, Hiroshi, Matsuo, Naoto (2011) Structural Property of Pentacene Film Prepared by Hydrogen Chemical Transport Deposition. Japanese Journal of Applied Physics, 50 (2) 28002 doi:10.7567/jjap.50.028002
Kinoshita, Akira, Nakano, Tomoyasu (1966) Production of Cuprous Oxide Single Crystal by Melt. Japanese Journal of Applied Physics, 5 (11) 1121 doi:10.1143/jjap.5.1121
 
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