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Yoshimura, Satoru, Sugimoto, Satoshi, Takeuchi, Takae, Murai, Kensuke, Kiuchi, Masato (2023) Deposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1056. 168707 doi:10.1016/j.nima.2023.168707

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Reference TypeJournal (article/letter/editorial)
TitleDeposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane
JournalNuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
AuthorsYoshimura, SatoruAuthor
Sugimoto, SatoshiAuthor
Takeuchi, TakaeAuthor
Murai, KensukeAuthor
Kiuchi, MasatoAuthor
Year2023 (November)Volume1056
PublisherElsevier BV
DOIdoi:10.1016/j.nima.2023.168707Search in ResearchGate
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Mindat Ref. ID16865280Long-form Identifiermindat:1:5:16865280:0
GUID0
Full ReferenceYoshimura, Satoru, Sugimoto, Satoshi, Takeuchi, Takae, Murai, Kensuke, Kiuchi, Masato (2023) Deposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1056. 168707 doi:10.1016/j.nima.2023.168707
Plain TextYoshimura, Satoru, Sugimoto, Satoshi, Takeuchi, Takae, Murai, Kensuke, Kiuchi, Masato (2023) Deposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1056. 168707 doi:10.1016/j.nima.2023.168707
In(2023) Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment Vol. 1056. Elsevier BV

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Yoshimura, Satoru, Sugimoto, Satoshi, Takeuchi, Takae, Murai, Kensuke, Kiuchi, Masato (2019) Characteristics of films deposited by the irradiation of GeCHx+ ions produced from hexamethyldigermane and their dependence on the injected ion energy. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 461. 1-5 doi:10.1016/j.nimb.2019.09.014
Yoshimura, Satoru, Sugimoto, Satoshi, Takeuchi, Takae, Murai, Kensuke, Kiuchi, Masato (2022) Low-energy Ar+ ion beam induced chemical vapor deposition of silicon carbide films using dimethylsilane. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 527. 40-44 doi:10.1016/j.nimb.2022.07.016
Yoshimura, Satoru, Sugimoto, Satoshi, Takeuchi, Takae, Murai, Kensuke, Kiuchi, Masato (2022) Low-energy O+ ion beam induced chemical vapor deposition using tetraethyl orthosilicate for silicon dioxide film formation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 511. 113-117 doi:10.1016/j.nimb.2021.11.022
Yoshimura, Satoru, Sugimoto, Satoshi, Takeuchi, Takae, Murai, Kensuke, Kiuchi, Masato (2018) Injected ion energy dependence of SiC film deposited by low-energy SiC 3 H 9 + ion beam produced from hexamethyldisilane. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 420. 6-11 doi:10.1016/j.nimb.2018.01.031
Yoshimura, Satoru, Sugimoto, Satoshi, Takeuchi, Takae, Murai, Kensuke, Kiuchi, Masato (2018) Identification of fragment ions produced from hexamethyldisilazane and production of low-energy mass-selected fragment ion beam. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 430. 1-5 doi:10.1016/j.nimb.2018.05.040
Yoshimura, Satoru, Sugimoto, Satoshi, Takeuchi, Takae, Murai, Kensuke, Kiuchi, Masato (2021) Production of low-energy SiCH3+ and SiC2H7+ ion beams for 3C-SiC film formation by selecting fragment ions from dimethylsilane. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 487. 85-89 doi:10.1016/j.nimb.2020.12.001
Yoshimura, Satoru, Sugimoto, Satoshi, Takeuchi, Takae, Kiuchi, Masato (2020) Production of low-energy fragment-ion beams from hexamethyldisiloxane and the irradiation of SiO+ ion beam to substrates with supplemental oxygen gas for SiO2 film formation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 479. 13-17 doi:10.1016/j.nimb.2020.06.019
Matsutani, Takaomi, Kiuchi, Masato, Takeuchi, Takae (2007) Preparation of Ge–C films by low-energy ion beam induced chemical vapor deposition with hexamethyldigermane. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 257 (1). 261-264 doi:10.1016/j.nimb.2007.01.018
Yoshimura, Satoru, Takeuchi, Takae, Kiuchi, Masato (2024) Low-energy O+ or SiO+ ion beam induced deposition of silicon oxide using hexamethyldisiloxane. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 549. 165276 doi:10.1016/j.nimb.2024.165276
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Drakopoulou, Evangelia (2023) KM3NeT: Status and physics results. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1056. 168592 doi:10.1016/j.nima.2023.168592
 
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