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Sik Koh, Tae, Anushkkaran, Periyasamy, Mahadik, Mahadeo A., Chae, Weon-Sik, Hwi Lee, Hyun, Hee Choi, Sun, Suk Jang, Jum (2024) Kinetic study of the enhanced photoelectrochemical properties of microwave-assisted Al and Si co-doped Zr-Fe2O3 photoanodes. Applied Surface Science, 642. 158615 doi:10.1016/j.apsusc.2023.158615

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Reference TypeJournal (article/letter/editorial)
TitleKinetic study of the enhanced photoelectrochemical properties of microwave-assisted Al and Si co-doped Zr-Fe2O3 photoanodes
JournalApplied Surface Science
AuthorsSik Koh, TaeAuthor
Anushkkaran, PeriyasamyAuthor
Mahadik, Mahadeo A.Author
Chae, Weon-SikAuthor
Hwi Lee, HyunAuthor
Hee Choi, SunAuthor
Suk Jang, JumAuthor
Year2024 (January)Volume642
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2023.158615Search in ResearchGate
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Mindat Ref. ID16878191Long-form Identifiermindat:1:5:16878191:3
GUID0
Full ReferenceSik Koh, Tae, Anushkkaran, Periyasamy, Mahadik, Mahadeo A., Chae, Weon-Sik, Hwi Lee, Hyun, Hee Choi, Sun, Suk Jang, Jum (2024) Kinetic study of the enhanced photoelectrochemical properties of microwave-assisted Al and Si co-doped Zr-Fe2O3 photoanodes. Applied Surface Science, 642. 158615 doi:10.1016/j.apsusc.2023.158615
Plain TextSik Koh, Tae, Anushkkaran, Periyasamy, Mahadik, Mahadeo A., Chae, Weon-Sik, Hwi Lee, Hyun, Hee Choi, Sun, Suk Jang, Jum (2024) Kinetic study of the enhanced photoelectrochemical properties of microwave-assisted Al and Si co-doped Zr-Fe2O3 photoanodes. Applied Surface Science, 642. 158615 doi:10.1016/j.apsusc.2023.158615
In(2024) Applied Surface Science Vol. 642. Elsevier BV

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