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Zhao, Jing, Shang, Chii, Yin, Ran (2023) A High-Radical-Yield Advanced Oxidation Process Coupling Far-UVC Radiation with Chlorinated Cyanurates for Micropollutant Degradation in Water. Environmental Science & Technology, 57 (47) 18867-18876 doi:10.1021/acs.est.3c00255

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Reference TypeJournal (article/letter/editorial)
TitleA High-Radical-Yield Advanced Oxidation Process Coupling Far-UVC Radiation with Chlorinated Cyanurates for Micropollutant Degradation in Water
JournalEnvironmental Science & Technology
AuthorsZhao, JingAuthor
Shang, ChiiAuthor
Yin, RanAuthor
Year2023 (November 28)Volume57
Issue47
PublisherAmerican Chemical Society (ACS)
DOIdoi:10.1021/acs.est.3c00255Search in ResearchGate
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Mindat Ref. ID16961949Long-form Identifiermindat:1:5:16961949:9
GUID0
Full ReferenceZhao, Jing, Shang, Chii, Yin, Ran (2023) A High-Radical-Yield Advanced Oxidation Process Coupling Far-UVC Radiation with Chlorinated Cyanurates for Micropollutant Degradation in Water. Environmental Science & Technology, 57 (47) 18867-18876 doi:10.1021/acs.est.3c00255
Plain TextZhao, Jing, Shang, Chii, Yin, Ran (2023) A High-Radical-Yield Advanced Oxidation Process Coupling Far-UVC Radiation with Chlorinated Cyanurates for Micropollutant Degradation in Water. Environmental Science & Technology, 57 (47) 18867-18876 doi:10.1021/acs.est.3c00255
In(2023, November) Environmental Science & Technology Vol. 57 (47) American Chemical Society (ACS)


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