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Fernandes, Isabela Cristina, Hadich, Tayan Vieira, Amorim, Milena Kowalczuk Manosso, Turri, Rafael Gustavo, Rangel, Elidiane C., Dias da Silva, José Humberto, Durrant, Steven F. (2018) Structural and optical properties of a-C:H:O:Cl and a-C:H:Si:O:Cl films obtained by Plasma Enhanced Chemical Vapor Deposition. Materials Chemistry and Physics, 214. 277-284 doi:10.1016/j.matchemphys.2018.04.097

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Reference TypeJournal (article/letter/editorial)
TitleStructural and optical properties of a-C:H:O:Cl and a-C:H:Si:O:Cl films obtained by Plasma Enhanced Chemical Vapor Deposition
JournalMaterials Chemistry and Physics
AuthorsFernandes, Isabela CristinaAuthor
Hadich, Tayan VieiraAuthor
Amorim, Milena Kowalczuk ManossoAuthor
Turri, Rafael GustavoAuthor
Rangel, Elidiane C.Author
Dias da Silva, José HumbertoAuthor
Durrant, Steven F.Author
Year2018 (August)Volume214
PublisherElsevier BV
DOIdoi:10.1016/j.matchemphys.2018.04.097Search in ResearchGate
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Mindat Ref. ID3064536Long-form Identifiermindat:1:5:3064536:3
GUID0
Full ReferenceFernandes, Isabela Cristina, Hadich, Tayan Vieira, Amorim, Milena Kowalczuk Manosso, Turri, Rafael Gustavo, Rangel, Elidiane C., Dias da Silva, José Humberto, Durrant, Steven F. (2018) Structural and optical properties of a-C:H:O:Cl and a-C:H:Si:O:Cl films obtained by Plasma Enhanced Chemical Vapor Deposition. Materials Chemistry and Physics, 214. 277-284 doi:10.1016/j.matchemphys.2018.04.097
Plain TextFernandes, Isabela Cristina, Hadich, Tayan Vieira, Amorim, Milena Kowalczuk Manosso, Turri, Rafael Gustavo, Rangel, Elidiane C., Dias da Silva, José Humberto, Durrant, Steven F. (2018) Structural and optical properties of a-C:H:O:Cl and a-C:H:Si:O:Cl films obtained by Plasma Enhanced Chemical Vapor Deposition. Materials Chemistry and Physics, 214. 277-284 doi:10.1016/j.matchemphys.2018.04.097
In(2018) Materials Chemistry and Physics Vol. 214. Elsevier BV

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