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de Oliveira Neto, Antonio M., Schreiner, Wido H., Justo, João F., de Oliveira, Alexandre M., Rangel, Elidiane C., Durrant, Steven F. (2019) Characterization of amorphous carbon films by PECVD and plasma ion implantation: The role of fluorine and sulfur doping. Materials Chemistry and Physics, 227. 170-175 doi:10.1016/j.matchemphys.2019.02.008

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Reference TypeJournal (article/letter/editorial)
TitleCharacterization of amorphous carbon films by PECVD and plasma ion implantation: The role of fluorine and sulfur doping
JournalMaterials Chemistry and Physics
Authorsde Oliveira Neto, Antonio M.Author
Schreiner, Wido H.Author
Justo, João F.Author
de Oliveira, Alexandre M.Author
Rangel, Elidiane C.Author
Durrant, Steven F.Author
Year2019 (April)Volume227
PublisherElsevier BV
DOIdoi:10.1016/j.matchemphys.2019.02.008Search in ResearchGate
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Mindat Ref. ID3065332Long-form Identifiermindat:1:5:3065332:6
GUID0
Full Referencede Oliveira Neto, Antonio M., Schreiner, Wido H., Justo, João F., de Oliveira, Alexandre M., Rangel, Elidiane C., Durrant, Steven F. (2019) Characterization of amorphous carbon films by PECVD and plasma ion implantation: The role of fluorine and sulfur doping. Materials Chemistry and Physics, 227. 170-175 doi:10.1016/j.matchemphys.2019.02.008
Plain Textde Oliveira Neto, Antonio M., Schreiner, Wido H., Justo, João F., de Oliveira, Alexandre M., Rangel, Elidiane C., Durrant, Steven F. (2019) Characterization of amorphous carbon films by PECVD and plasma ion implantation: The role of fluorine and sulfur doping. Materials Chemistry and Physics, 227. 170-175 doi:10.1016/j.matchemphys.2019.02.008
In(2019) Materials Chemistry and Physics Vol. 227. Elsevier BV

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