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Atanassova, E.D., Popova, L.I. (1993) Plasma nitridation of thin SiO2 films: AES, ELS and IR study. Journal of Nuclear Materials, 200 (3). 421-425 doi:10.1016/0022-3115(93)90320-x

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Reference TypeJournal (article/letter/editorial)
TitlePlasma nitridation of thin SiO2 films: AES, ELS and IR study
JournalJournal of Nuclear Materials
AuthorsAtanassova, E.D.Author
Popova, L.I.Author
Year1993 (May)Volume200
Issue3
PublisherElsevier BV
DOIdoi:10.1016/0022-3115(93)90320-xSearch in ResearchGate
Generate Citation Formats
Mindat Ref. ID4150507Long-form Identifiermindat:1:5:4150507:0
GUID0
Full ReferenceAtanassova, E.D., Popova, L.I. (1993) Plasma nitridation of thin SiO2 films: AES, ELS and IR study. Journal of Nuclear Materials, 200 (3). 421-425 doi:10.1016/0022-3115(93)90320-x
Plain TextAtanassova, E.D., Popova, L.I. (1993) Plasma nitridation of thin SiO2 films: AES, ELS and IR study. Journal of Nuclear Materials, 200 (3). 421-425 doi:10.1016/0022-3115(93)90320-x
In(1993, May) Journal of Nuclear Materials Vol. 200 (3) Elsevier BV

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Popova, L.I., Atanassova, E.D., Kolev, D.I., Nikolova, B.M. (1986) IR study of ultrathin plasma SiO2 and plasma treated thermal SiO2 films. Journal of Non-Crystalline Solids, 85 (3) 382-392 doi:10.1016/0022-3093(86)90010-4
Popova, L.I., Peneva, S.K., Tsukeva, E.A., Atanassova, E.D. (1989) On the behaviour of unusual crystalline states in thermally grown SiO2 thin films. Materials Letters, 8. 357-360 doi:10.1016/0167-577x(89)90007-4
Wilhelm, R. (1993) Characterization of plasma near surfaces. Journal of Nuclear Materials, 200 (3). 273-281 doi:10.1016/0022-3115(93)90295-a
Kleyn, Aart W. (1993) Preface. Journal of Nuclear Materials, 200 (3). doi:10.1016/0022-3115(93)90294-9
(1993) Author index. Journal of Nuclear Materials, 200 (3). 435-438 doi:10.1016/0022-3115(93)90323-q
(1993) Subject index. Journal of Nuclear Materials, 200 (3). 439-447 doi:10.1016/0022-3115(93)90324-r
Goedheer, W.J., Meijer, P.M. (1993) Numerical simulation of RF discharges for plasma processing. Journal of Nuclear Materials, 200 (3). 282-290 doi:10.1016/0022-3115(93)90296-b
(1993) Editorial Board. Journal of Nuclear Materials, 200 (1). doi:10.1016/0022-3115(93)90001-f
van Delft, F.C.M.J.M., Giesbers, J.B. (1993) The etch mechanisms of magnetic materials in an HCl plasma. Journal of Nuclear Materials, 200 (3). 366-370 doi:10.1016/0022-3115(93)90310-u
Kinoshita, Haruhisa, Ikegawa, Hiroyoshi (1993) Optical emission measurement of high-uniformity and high-density O2 supermagnetron plasma. Journal of Nuclear Materials, 200 (3). 296-299 doi:10.1016/0022-3115(93)90298-d
Mansur, L.K. (1993) The science and engineering of nuclear materials. Journal of Nuclear Materials, 200 (1). doi:10.1016/0022-3115(93)90002-g
 
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