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Tian, Xiubo, Wang, Xiaofeng, Tang, Baoyin, Chu, Paul K., Ko, Ping K., Cheng, Yiu-Chung (1999) Special modulator for high frequency, low-voltage plasma immersion ion implantation. Review of Scientific Instruments, 70 (3). 1824-1828 doi:10.1063/1.1149675

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Reference TypeJournal (article/letter/editorial)
TitleSpecial modulator for high frequency, low-voltage plasma immersion ion implantation
JournalReview of Scientific Instruments
AuthorsTian, XiuboAuthor
Wang, XiaofengAuthor
Tang, BaoyinAuthor
Chu, Paul K.Author
Ko, Ping K.Author
Cheng, Yiu-ChungAuthor
Year1999 (March)Volume70
Issue3
PublisherAIP Publishing
DOIdoi:10.1063/1.1149675Search in ResearchGate
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Mindat Ref. ID4881805Long-form Identifiermindat:1:5:4881805:2
GUID0
Full ReferenceTian, Xiubo, Wang, Xiaofeng, Tang, Baoyin, Chu, Paul K., Ko, Ping K., Cheng, Yiu-Chung (1999) Special modulator for high frequency, low-voltage plasma immersion ion implantation. Review of Scientific Instruments, 70 (3). 1824-1828 doi:10.1063/1.1149675
Plain TextTian, Xiubo, Wang, Xiaofeng, Tang, Baoyin, Chu, Paul K., Ko, Ping K., Cheng, Yiu-Chung (1999) Special modulator for high frequency, low-voltage plasma immersion ion implantation. Review of Scientific Instruments, 70 (3). 1824-1828 doi:10.1063/1.1149675
In(1999, March) Review of Scientific Instruments Vol. 70 (3) AIP Publishing

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Tian, Xiubo, Fan, Zhineng, Zeng, Xuchu, Zeng, Zhaoming, Tang, Baoyin, Chu, Paul K. (1999) In situ sample temperature measurement in plasma immersion ion implantation. Review of Scientific Instruments, 70 (6). 2818-2821 doi:10.1063/1.1149801
Tian, Xiubo, Zeng, Zhaoming, Zeng, Xuchu, Tang, Baoyin, Chu, Paul K. (2000) Efficacy of high-frequency, low-voltage plasma immersion ion implantation of a bar-shaped target. Journal of Applied Physics, 88 (5). 2221-2225 doi:10.1063/1.1287221
Tian, Xiubo, Tang, Baoyin, Chu, Paul K. (1999) Accurate determination of pulsed current waveform in plasma immersion ion implantation processes. Journal of Applied Physics, 86 (7). 3567-3570 doi:10.1063/1.371259
Tian, Xiubo, Chu, Paul K. (2000) Direct temperature monitoring for semiconductors in plasma immersion ion implantation. Review of Scientific Instruments, 71 (7). 2839-2842 doi:10.1063/1.1150700
Zhu, Zongtao, Gong, Chunzhi, Tian, Xiubo, Yang, Shiqin, Fu, Ricky K. Y., Chu, Paul K. (2011) High voltage pulser with a fast fall-time for plasma immersion ion implantation. Review of Scientific Instruments, 82 (4). 45102pp. doi:10.1063/1.3575320
Gong, Chunzhi, Tian, Xiubo, Yang, Shiqin, Fu, Ricky K. Y., Chu, Paul K. (2008) Direct coupling of pulsed radio frequency and pulsed high power in novel pulsed power system for plasma immersion ion implantation. Review of Scientific Instruments, 79 (4). 43501pp. doi:10.1063/1.2906220
Fu, Ricky K. Y., Tian, Xiubo, Chu, Paul K. (2003) Enhancement of implantation energy using a conducting grid in plasma immersion ion implantation of dielectric/polymeric materials. Review of Scientific Instruments, 74 (8). 3697-3700 doi:10.1063/1.1588757
Tian, Xiubo, Fu, Ricky K. Y., Chu, Paul K., Anders, Andre, Gong, Chunzhi, Yang, Shiqin (2003) Flexible system for multiple plasma immersion ion implantation-deposition processes. Review of Scientific Instruments, 74 (12). 5137-5140 doi:10.1063/1.1626012
Wu, Zhongzhen, Tian, Xiubo, Shi, Jingwei, Wang, Zeming, Gong, Chunzhi, Yang, Shiqin, Chu, Paul K. (2011) Novel plasma immersion ion implantation and deposition hardware and technique based on high power pulsed magnetron discharge. Review of Scientific Instruments, 82 (3). 33511pp. doi:10.1063/1.3565175
Tang, D. L., Fu, R. K. Y., Tian, X. B., Chu, P. K. (2003) Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation. Review of Scientific Instruments, 74 (5). 2704-2708 doi:10.1063/1.1568559
Wang, Langping, Huang, Lei, Xie, Zhiwen, Wang, Xiaofeng, Tang, Baoyin (2008) Fourth-generation plasma immersion ion implantation and deposition facility for hybrid surface modification layer fabrication. Review of Scientific Instruments, 79 (2). 23306pp. doi:10.1063/1.2870088
 
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